-
1
-
-
28744445187
-
Virtual metrology: A solution for wafer to wafer advanced process control
-
San Jose, CA, Sep
-
P.-H. Chen, S. Wu, J.-S. Lin, F. Ko, H. Lo, J. Wang, C.-H. Yu, and M.-S. Liang, "Virtual metrology: A solution for wafer to wafer advanced process control," in Proc. IEEE Int. Symp. Semiconductor Manufacturing, San Jose, CA, Sep. 2005, pp. 155-157.
-
(2005)
Proc. IEEE Int. Symp. Semiconductor Manufacturing
, pp. 155-157
-
-
Chen, P.-H.1
Wu, S.2
Lin, J.-S.3
Ko, F.4
Lo, H.5
Wang, J.6
Yu, C.-H.7
Liang, M.-S.8
-
2
-
-
33646725309
-
A processing quality prognostics scheme for plasma sputtering in TFT-LCD manufacturing
-
May
-
Y.-C. Su, M.-H. Hung, F.-T. Cheng, and Y.-T. Chen, "A processing quality prognostics scheme for plasma sputtering in TFT-LCD manufacturing," IEEE Trans. Semiconduct. Manuf., vol. 19, no. 2, pp. 183-194, May 2006.
-
(2006)
IEEE Trans. Semiconduct. Manuf
, vol.19
, Issue.2
, pp. 183-194
-
-
Su, Y.-C.1
Hung, M.-H.2
Cheng, F.-T.3
Chen, Y.-T.4
-
3
-
-
33646730899
-
Intelligent prognostics system design and implementation
-
May
-
Y.-C. Su, F.-T. Cheng, M.-H. Hung, and H.-C. Huang, "Intelligent prognostics system design and implementation," IEEE Trans. Semiconduct. Manuf., vol. 19, no. 2, pp. 195-207, May 2006.
-
(2006)
IEEE Trans. Semiconduct. Manuf
, vol.19
, Issue.2
, pp. 195-207
-
-
Su, Y.-C.1
Cheng, F.-T.2
Hung, M.-H.3
Huang, H.-C.4
-
4
-
-
40649088296
-
Virtual metrology technique for semiconductor manufacturing
-
Jul
-
Y.-J. Chang, Y. Kang, C.-L. Hsu, C.-T. Chang, and T. Y. Chan, "Virtual metrology technique for semiconductor manufacturing," in Proc. Int. Joint Conf. Neural Networks (IJCNN'06), Jul. 2006, pp. 5289-5293.
-
(2006)
Proc. Int. Joint Conf. Neural Networks (IJCNN'06)
, pp. 5289-5293
-
-
Chang, Y.-J.1
Kang, Y.2
Hsu, C.-L.3
Chang, C.-T.4
Chan, T.Y.5
-
5
-
-
34347398446
-
-
M.-H. Hung, T.-H. Lin, F.-T. Cheng, and R.-C. Lin, A novel virtual metrology scheme for predicting CVD thickness in semiconductor manufacturing, Proc. IEEE/ASME Trans. Mechatronics, 12, no. 3, pp. 308-316, Jun. 2007.
-
M.-H. Hung, T.-H. Lin, F.-T. Cheng, and R.-C. Lin, "A novel virtual metrology scheme for predicting CVD thickness in semiconductor manufacturing," Proc. IEEE/ASME Trans. Mechatronics, vol. 12, no. 3, pp. 308-316, Jun. 2007.
-
-
-
-
6
-
-
36348945773
-
Method for evaluating reliance level of a virtual metrology system
-
Roma, Italy, Apr
-
F.-T. Cheng, Y.-T. Chen, Y.-C. Su, and D.-L. Zeng, "Method for evaluating reliance level of a virtual metrology system," in Proc. IEEE Int. Conf. Robotics Automation, Roma, Italy, Apr. 2007, pp. 1590-1596.
-
(2007)
Proc. IEEE Int. Conf. Robotics Automation
, pp. 1590-1596
-
-
Cheng, F.-T.1
Chen, Y.-T.2
Su, Y.-C.3
Zeng, D.-L.4
-
7
-
-
50249154417
-
Importance of Data Quality in Virtual Metrology
-
Paris, France, Nov
-
Y.-T. Huang, F.-T. Cheng, and Y.-T. Chen, "Importance of Data Quality in Virtual Metrology," in Proc. 32th Annual Conf. IEEE Industrial Electronics Soc. (IECON 2006), Paris, France, Nov. 2006, pp. 3727-3732.
-
(2006)
Proc. 32th Annual Conf. IEEE Industrial Electronics Soc. (IECON 2006)
, pp. 3727-3732
-
-
Huang, Y.-T.1
Cheng, F.-T.2
Chen, Y.-T.3
-
9
-
-
28244475768
-
Semiconductor manufacturing process control and monitoring: A fab-wide framework
-
S. J. Qin, G. Cherry, R. Good, J. Wang, and C. A. Harrison, "Semiconductor manufacturing process control and monitoring: A fab-wide framework," J. Process Contr., vol. 16, pp. 179-191, 2006.
-
(2006)
J. Process Contr
, vol.16
, pp. 179-191
-
-
Qin, S.J.1
Cherry, G.2
Good, R.3
Wang, J.4
Harrison, C.A.5
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