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Volumn 20, Issue 4, 2007, Pages 566-571

Dual-phase virtual metrology scheme

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED PROCESS CONTROLS; DEPOSITION EQUIPMENTS; GLOBAL SIMILARITIES; ILLUSTRATIVE EXAMPLES; PHASE I; PHASE II; PROCESS DATUM; SEMICONDUCTOR INDUSTRIES; TFT LCDS; THIN-FILM TRANSISTOR LIQUID CRYSTAL DISPLAYS; VIRTUAL METROLOGIES; WORK PIECES;

EID: 38949143586     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2007.907633     Document Type: Article
Times cited : (69)

References (10)
  • 2
    • 33646725309 scopus 로고    scopus 로고
    • A processing quality prognostics scheme for plasma sputtering in TFT-LCD manufacturing
    • May
    • Y.-C. Su, M.-H. Hung, F.-T. Cheng, and Y.-T. Chen, "A processing quality prognostics scheme for plasma sputtering in TFT-LCD manufacturing," IEEE Trans. Semiconduct. Manuf., vol. 19, no. 2, pp. 183-194, May 2006.
    • (2006) IEEE Trans. Semiconduct. Manuf , vol.19 , Issue.2 , pp. 183-194
    • Su, Y.-C.1    Hung, M.-H.2    Cheng, F.-T.3    Chen, Y.-T.4
  • 3
    • 33646730899 scopus 로고    scopus 로고
    • Intelligent prognostics system design and implementation
    • May
    • Y.-C. Su, F.-T. Cheng, M.-H. Hung, and H.-C. Huang, "Intelligent prognostics system design and implementation," IEEE Trans. Semiconduct. Manuf., vol. 19, no. 2, pp. 195-207, May 2006.
    • (2006) IEEE Trans. Semiconduct. Manuf , vol.19 , Issue.2 , pp. 195-207
    • Su, Y.-C.1    Cheng, F.-T.2    Hung, M.-H.3    Huang, H.-C.4
  • 5
    • 34347398446 scopus 로고    scopus 로고
    • M.-H. Hung, T.-H. Lin, F.-T. Cheng, and R.-C. Lin, A novel virtual metrology scheme for predicting CVD thickness in semiconductor manufacturing, Proc. IEEE/ASME Trans. Mechatronics, 12, no. 3, pp. 308-316, Jun. 2007.
    • M.-H. Hung, T.-H. Lin, F.-T. Cheng, and R.-C. Lin, "A novel virtual metrology scheme for predicting CVD thickness in semiconductor manufacturing," Proc. IEEE/ASME Trans. Mechatronics, vol. 12, no. 3, pp. 308-316, Jun. 2007.
  • 9
    • 28244475768 scopus 로고    scopus 로고
    • Semiconductor manufacturing process control and monitoring: A fab-wide framework
    • S. J. Qin, G. Cherry, R. Good, J. Wang, and C. A. Harrison, "Semiconductor manufacturing process control and monitoring: A fab-wide framework," J. Process Contr., vol. 16, pp. 179-191, 2006.
    • (2006) J. Process Contr , vol.16 , pp. 179-191
    • Qin, S.J.1    Cherry, G.2    Good, R.3    Wang, J.4    Harrison, C.A.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.