A Virtual Metrology system for predicting CVD thickness with equipment variables and qualitative clustering

IEEE International Conference on Emerging Technologies and Factory Automation, ETFA

Volumn , Issue , 2011, Pages

  Susto, Gian Antonio ^a   Beghi, Alessandro ^a   De Luca, Cristina ^b  

^a UNIVERSITY OF PADOVA   (Italy)

^b INFINEON TECHNOLOGIES AUSTRIA AG   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

DATA CLUSTERING; DATA MINING TECHNIQUES; DATA SETS; GOOD YIELD; HIGH-QUALITY STANDARDS; SEMICONDUCTOR MANUFACTURING; VIRTUAL METROLOGY;

CLUSTERING ALGORITHMS; DATA MINING; FACTORY AUTOMATION; MEASUREMENTS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; UNITS OF MEASUREMENT;

CHEMICAL VAPOR DEPOSITION;

EID: 80655138971     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ETFA.2011.6059209     Document Type: Conference Paper

References (7)

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