A predictive maintenance system based on regularization methods for ion-implantation

ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings

Volumn , Issue , 2012, Pages 175-180

  Susto, Gian Antonio ^a   Schirru, Andrea ^b   Pampuri, Simone ^b   Beghi, Alessandro ^a  

^a UNIVERSITY OF PADOVA   (Italy)

^b UNIVERSITY OF PAVIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATED IONS; ELASTIC NET; MAINTENANCE ACTIVITY; MAINTENANCE OPERATIONS; MATERIAL SUBSTRATES; PHYSICAL VARIABLES; PREDICTIVE MAINTENANCE; PREDICTIVE PERFORMANCE; REGULARIZATION METHODS; RIDGE REGRESSION; SEMICONDUCTOR DATA; SEMICONDUCTOR MANUFACTURING; STATISTICAL MODELING; TUNGSTEN FILAMENTS;

ION IMPLANTATION; ION SOURCES; REGRESSION ANALYSIS; SEMICONDUCTOR DEVICE MANUFACTURE; TUNGSTEN;

MAINTENANCE;

EID: 84863888440     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASMC.2012.6212884     Document Type: Conference Paper

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