Accuracy and real-time considerations for implementing various virtual metrology algorithms

IEEE Transactions on Semiconductor Manufacturing

Volumn 21, Issue 3, 2008, Pages 426-434

  Su, Yu Chuan ^a,b   Lin, Tung Ho ^a,c   Cheng, Fan Tien ^a,d   Wu, Wei Ming ^a,d  

^a IEEE

^b FAR EAST UNIVERSITY   (Taiwan)

^c CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY   (Taiwan)

^d NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Back propagation neural networks (BPNN); Multiple regression (MR); Run to run control (R2R control); Simple recurrent neural networks (SRNN); Virtual metrology (VM); Wafer to wafer advanced process control (W2W APC)

Indexed keywords

ARTIFICIAL INTELLIGENCE; CHEMICAL PLANTS; CONTROL THEORY; COST EFFECTIVENESS; ELECTRIC CONDUCTIVITY; FOOD PROCESSING; INTELLIGENT CONTROL; LIQUID CRYSTAL DISPLAYS; MEASUREMENTS; NEURAL NETWORKS; PRODUCTION CONTROL; PRODUCTION ENGINEERING; RECURRENT NEURAL NETWORKS; SEMICONDUCTING INDIUM; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR MATERIALS; TESTING;

ADVANCED-PROCESS-CONTROL; BACK-PROPAGATION NEURAL NETWORKS; BACK-PROPAGATION NEURAL NETWORKS (BPNN); CHEMICAL-; COST-EFFECTIVE APPROACH; DEPOSITION PROCESSING; ELECTRONIC DEVICES; MULTIPLE REGRESSION (MR); MULTIPLE REGRESSIONS; PHYSICAL MEASUREMENTS; PROCESS CAPABILITIES; PRODUCT ION YIELDS; PRODUCTION PROCESSES; REAL-TIME REQUIREMENTS; RUN-TO-RUN CONTROL; RUN-TO-RUN CONTROL (R2R CONTROL); SEMICONDUCTOR INDUSTRIES; SIMPLE RECURRENT NEURAL NETWORKS (SRNN); TEST RESULTS; TFT-LCD; VIRTUAL METROLOGY; VIRTUAL METROLOGY (VM); WAFER-TO-WAFER ADVANCED PROCESS CONTROL (W2W APC);

PROCESS CONTROL;

EID: 49249085507     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2008.2001219     Document Type: Conference Paper

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