Indium diffusion through high-k dielectrics in high-k/InP stacks

Applied Physics Letters

Volumn 103, Issue 6, 2013, Pages

  Dong, H ^a   Cabrera, W ^a   Galatage, R V ^a   Santosh, K ^a   Brennan, B ^a   Qin, X ^a   McDonnell, S ^a   Zhernokletov, D ^b   Hinkle, C L ^a   Cho, K ^a   Chabal, Y J ^a   Wallace, R M ^a,b  

^a The University of Texas at Dallas   (United States)

^b UNIVERSITY OF TEXAS AT DALLAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANGLE-RESOLVED X-RAY PHOTOELECTRON SPECTROSCOPY; HIGH-K DIELECTRIC; INP(100); LOW ENERGY ION SCATTERING SPECTROSCOPY;

ATOMIC LAYER DEPOSITION; DIELECTRIC MATERIALS; HAFNIUM OXIDES; INDIUM; PHOTOELECTRONS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIFFUSION;

EID: 84881633934     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4817932     Document Type: Article

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