-
1
-
-
0003127709
-
Sputtering by Particle Bombardment i Physical Sputtering of Single-Element Solids
-
Springer: Berlin
-
Sputtering by Particle Bombardment I Physical Sputtering of Single-Element Solids; Topics in Applied Physics Vol. 47; Behrisch, R., Ed.; Springer: Berlin, 1981; pp 1-256.
-
(1981)
Topics in Applied Physics
, vol.47
, pp. 1-256
-
-
Behrisch, R.1
-
2
-
-
0003127709
-
Sputtering by Particle Bombardment II Sputtering of Alloys and Compounds, Electron and Neutron Sputtering, Surface Topography
-
Springer: Berlin
-
Sputtering by Particle Bombardment II Sputtering of Alloys and Compounds, Electron and Neutron Sputtering, Surface Topography; Topics in Applied Physics Vol. 52; Behrisch, R., Ed.; Springer: Berlin, 1983; pp 1-355.
-
(1983)
Topics in Applied Physics
, vol.52
, pp. 1-355
-
-
Behrisch, R.1
-
3
-
-
62649170245
-
Sputtering by Particle Bombardment Experiments and Computer Calculations from Threshold to MeV Energies
-
Springer: Berlin
-
Sputtering by Particle Bombardment Experiments and Computer Calculations from Threshold to MeV Energies; Topics in Applied Physics Vol. 110; Behrisch, R., Eckstein, W., Eds.; Springer: Berlin, 2007; pp 1-449.
-
(2007)
Topics in Applied Physics
, vol.110
, pp. 1-449
-
-
Behrisch, R.1
Eckstein, W.2
-
4
-
-
0028055432
-
Sputtering of Compound Semiconductor Surfaces. I. Ion-Solid Interactions and Sputtering Yields
-
Malherbe, J. B. Sputtering of Compound Semiconductor Surfaces. I. Ion-Solid Interactions and Sputtering Yields Crit. Rev. Solid State Mater. Sci. 1994, 19, 55-127
-
(1994)
Crit. Rev. Solid State Mater. Sci.
, vol.19
, pp. 55-127
-
-
Malherbe, J.B.1
-
5
-
-
0028579205
-
Sputtering of Compound Semiconductor Surfaces. II. Compositional Changes and Radiation-Induced Topography and Damage
-
Malherbe, J. B. Sputtering of Compound Semiconductor Surfaces. II. Compositional Changes and Radiation-Induced Topography and Damage Crit. Rev. Solid State Mater. Sci. 1994, 19, 129-195
-
(1994)
Crit. Rev. Solid State Mater. Sci.
, vol.19
, pp. 129-195
-
-
Malherbe, J.B.1
-
6
-
-
18444377038
-
An Accurate Semi-Empirical Equation for Sputtering Yields, I: For Argon Ions
-
Seah, M. P.; Clifford, C. A.; Green, F. M.; Gilmore, I. S. An Accurate Semi-Empirical Equation for Sputtering Yields, I: for Argon Ions Surf. Interface Anal. 2005, 37, 444-458
-
(2005)
Surf. Interface Anal.
, vol.37
, pp. 444-458
-
-
Seah, M.P.1
Clifford, C.A.2
Green, F.M.3
Gilmore, I.S.4
-
7
-
-
14544267612
-
An Accurate Semi-Empirical Equation for Sputtering Yields, II: For Neon, Argon and Xenon Ions
-
Seah, M. P. An Accurate Semi-Empirical Equation for Sputtering Yields, II: for Neon, Argon and Xenon Ions Nucl. Instrum. Methods, Sect. B 2005, 229, 348-358
-
(2005)
Nucl. Instrum. Methods, Sect. B
, vol.229
, pp. 348-358
-
-
Seah, M.P.1
-
8
-
-
84879441300
-
-
SRIM (2006)
-
SRIM (2006) available free from www.srim.org/SRIM/SRIM2006.htm.
-
-
-
-
9
-
-
0000172277
-
Depth Profiling in AES and XPS
-
2 nd ed. Briggs, D. Seah, M. P. Wiley: Chichester, Chapter 4
-
Hofmann, S. Depth Profiling in AES and XPS. Practical Surface Analysis, 2 nd ed.; Briggs, D.,; Seah, M. P., Eds.; Wiley: Chichester, 1990; Vol. 1, Chapter 4, pp 143-199.
-
(1990)
Practical Surface Analysis
, vol.1
, pp. 143-199
-
-
Hofmann, S.1
-
10
-
-
0001739145
-
-
2 nd ed. Briggs, D. Seah, M. P. Wiley: Chichester, Chapter 3
-
Wittmaack, K. Basic Aspects of Sputter Depth Profiling, 2 nd ed.; Briggs, D.; Seah, M. P., Eds.; Wiley: Chichester, 1992; Vol. 2, Chapter 3, pp 105-175.
-
(1992)
Basic Aspects of Sputter Depth Profiling
, vol.2
, pp. 105-175
-
-
Wittmaack, K.1
-
11
-
-
0001377980
-
Dynamic SIMS and Its Applications in Microelectronics
-
2 nd ed. Briggs, D. Seah, M. P. Wiley: Chichester, Chapter 5
-
Dowsett, M.; Clark, E. A. Dynamic SIMS and Its Applications in Microelectronics. Practical Surface Analysis, 2 nd ed.; Briggs, D.; Seah, M. P., Eds.; Wiley: Chichester, 1992; Vol. 2, Chapter 5, pp 229-301.
-
(1992)
Practical Surface Analysis
, vol.2
, pp. 229-301
-
-
Dowsett, M.1
Clark, E.A.2
-
12
-
-
78650708805
-
Molecular Surface Mass Spectrometry by SIMS
-
2 nd ed. Vickerman, J. C. Gilmore, I. S. Wiley: Chichester, Chapter 4
-
Vickerman, J. C. Molecular Surface Mass Spectrometry by SIMS. Surface Analysis The Principal Techniques, 2 nd ed.; Vickerman, J. C.; Gilmore, I. S., Eds.; Wiley: Chichester, 2009; Chapter 4, pp 113-205.
-
(2009)
Surface Analysis the Principal Techniques
, pp. 113-205
-
-
Vickerman, J.C.1
-
13
-
-
77951250057
-
Cluster Secondary Ion Mass Spectrometry of Polymers and Related Materials
-
Mahoney, C. M. Cluster Secondary Ion Mass Spectrometry of Polymers and Related Materials Mass Spectrom. Rev. 2010, 29, 247-293
-
(2010)
Mass Spectrom. Rev.
, vol.29
, pp. 247-293
-
-
Mahoney, C.M.1
-
14
-
-
0035976031
-
Materials Processing by Gas Cluster Ion Beams
-
Yamada, I.; Matsuo, J.; Toyoda, N.; Kirkpatrick, A. Materials Processing by Gas Cluster Ion Beams Mater. Sci. Eng., R 2001, 34, 231-295
-
(2001)
Mater. Sci. Eng., R
, vol.34
, pp. 231-295
-
-
Yamada, I.1
Matsuo, J.2
Toyoda, N.3
Kirkpatrick, A.4
-
15
-
-
78449275839
-
SIMS with Highly Excited Primary Beams for Molecular Depth Profiling and Imaging of Organic and Biological Materials
-
Matsuo, J.; Ninomiya, S.; Yamada, H.; Ichiki, K.; Wakamatsu, Y.; Hada, M.; Seki, T.; Aoki, T. SIMS with Highly Excited Primary Beams for Molecular Depth Profiling and Imaging of Organic and Biological Materials Surf. Interface Anal. 2010, 42, 1612-1615
-
(2010)
Surf. Interface Anal.
, vol.42
, pp. 1612-1615
-
-
Matsuo, J.1
Ninomiya, S.2
Yamada, H.3
Ichiki, K.4
Wakamatsu, Y.5
Hada, M.6
Seki, T.7
Aoki, T.8
-
17
-
-
75749158584
-
Organic Depth Profiling of a Nanostructured Delta Layer Reference Material using Large Argon Cluster Ions
-
Lee, J. L. S.; Ninomiya, S.; Matsuo, J.; Gilmore, I. S.; Seah, M. P.; Shard, A. G. Organic Depth Profiling of a Nanostructured Delta Layer Reference Material using Large Argon Cluster Ions Anal. Chem. 2010, 82, 98-105
-
(2010)
Anal. Chem.
, vol.82
, pp. 98-105
-
-
Lee, J.L.S.1
Ninomiya, S.2
Matsuo, J.3
Gilmore, I.S.4
Seah, M.P.5
Shard, A.G.6
-
19
-
-
56449114449
-
A Fragment-Free Ionization Technique for Organic Mass Spectrometry with Large Ar Cluster Ions
-
Ninomiya, S.; Nakata, Y.; Honda, Y.; Ichiki, K.; Seki, T.; Aoki, T.; Matsuo, J. A Fragment-Free Ionization Technique for Organic Mass Spectrometry with Large Ar Cluster Ions Appl. Surf. Sci. 2008, 255, 1588-1590
-
(2008)
Appl. Surf. Sci.
, vol.255
, pp. 1588-1590
-
-
Ninomiya, S.1
Nakata, Y.2
Honda, Y.3
Ichiki, K.4
Seki, T.5
Aoki, T.6
Matsuo, J.7
-
20
-
-
0031546202
-
Sputtering of Elemental Metals by Ar Cluster Ions
-
Matsuo, J.; Toyoda, N.; Akizuki, M.; Yamada, I. Sputtering of Elemental Metals by Ar Cluster Ions Nucl. Instrum. Methods Phys. Res., Sect. B 1997, 121, 459-463
-
(1997)
Nucl. Instrum. Methods Phys. Res., Sect. B
, vol.121
, pp. 459-463
-
-
Matsuo, J.1
Toyoda, N.2
Akizuki, M.3
Yamada, I.4
-
21
-
-
28544446597
-
Cluster Size Dependence of Sputtering Yield by Cluster Ion Beam Irradiation
-
Seki, T.; Murase, T.; Matsuo, J. Cluster Size Dependence of Sputtering Yield by Cluster Ion Beam Irradiation Nucl. Instrum. Methods Phys. Res., Sect. B 2006, 242, 179-181
-
(2006)
Nucl. Instrum. Methods Phys. Res., Sect. B
, vol.242
, pp. 179-181
-
-
Seki, T.1
Murase, T.2
Matsuo, J.3
-
22
-
-
77952412923
-
Sputtering Yield Measurements with Size-Selected Gas Cluster Ion Beams
-
Ichiki, K.; Ninomiya, S.; Seki, T.; Aoki, T.; Matsuo, J. Sputtering Yield Measurements with Size-Selected Gas Cluster Ion Beams Mater. Res. Soc. Symp. Proc. 2010, 1181, 135-140
-
(2010)
Mater. Res. Soc. Symp. Proc.
, vol.1181
, pp. 135-140
-
-
Ichiki, K.1
Ninomiya, S.2
Seki, T.3
Aoki, T.4
Matsuo, J.5
-
23
-
-
79251573221
-
Energy Effects on the Sputtering Yield of Si Bombarded with Gas Cluster Ion Beams
-
Ichiki, K.; Ninomiya, S.; Seki, T.; Aoki, T.; Matsuo, J. Energy Effects on the Sputtering Yield of Si Bombarded with Gas Cluster Ion Beams AIP Conf. Proc. 2011, 1321, 294-297
-
(2011)
AIP Conf. Proc.
, vol.1321
, pp. 294-297
-
-
Ichiki, K.1
Ninomiya, S.2
Seki, T.3
Aoki, T.4
Matsuo, J.5
-
24
-
-
84868700039
-
Sputtering Yields for Gold Using Argon Gas Cluster Ion Beams
-
Yang, L.; Seah, M. P.; Gilmore, I. S. Sputtering Yields for Gold Using Argon Gas Cluster Ion Beams J. Phys. Chem. C 2012, 116, 23735-23741
-
(2012)
J. Phys. Chem. C
, vol.116
, pp. 23735-23741
-
-
Yang, L.1
Seah, M.P.2
Gilmore, I.S.3
-
25
-
-
84860356093
-
Sputtering Yields of Gold Nanoparticles by C60 Ions
-
Yang, L.; Seah, M. P.; Lee, J. L. S.; Gilmore, I. S. Sputtering Yields of Gold Nanoparticles by C60 Ions J. Phys. Chem. C 2012, 116, 9311-9318
-
(2012)
J. Phys. Chem. C
, vol.116
, pp. 9311-9318
-
-
Yang, L.1
Seah, M.P.2
Lee, J.L.S.3
Gilmore, I.S.4
-
26
-
-
37649029056
-
Linearity and Additivity in Cluster-Induced Sputtering: A Molecular-Dynamics Study of Van der Waals Bonded Systems
-
Anders, C.; Urbassek, H. M.; Johnson, R. E. Linearity and Additivity in Cluster-Induced Sputtering: A Molecular-Dynamics Study of Van Der Waals Bonded Systems Phys. Rev. B 2004, 70, 155404
-
(2004)
Phys. Rev. B
, vol.70
, pp. 155404
-
-
Anders, C.1
Urbassek, H.M.2
Johnson, R.E.3
-
27
-
-
84879446085
-
-
to Be Published
-
Yang, L.; Seah, M. P.; Gilmore, I. S.; Morris, R. H.; Dowsett, M. G.; Boarino, L.; Sparnacci, K.; Laus, M. Studies of Nanoparticles by Secondary Ion Mass Spectrometry (SIMS). To be published.
-
Studies of Nanoparticles by Secondary Ion Mass Spectrometry (SIMS)
-
-
Yang, L.1
Seah, M.P.2
Gilmore, I.S.3
Morris, R.H.4
Dowsett, M.G.5
Boarino, L.6
Sparnacci, K.7
Laus, M.8
-
28
-
-
77953576224
-
Sputtering Yields of Compounds Using Argon
-
13 pages
-
Seah, M. P.; Nunney, T. S. Sputtering Yields of Compounds Using Argon J. Phys. D: Appl. Phys. 2010, 43, 253001 (13 pages)
-
(2010)
J. Phys. D: Appl. Phys.
, vol.43
, pp. 253001
-
-
Seah, M.P.1
Nunney, T.S.2
-
29
-
-
84866390166
-
Argon Cluster Ion Beams for Organic Depth Profiling: Results from a VAMAS Interlaboratory Study
-
Shard, A. G.; Havelund, R.; Seah, M. P.; Spencer, S. J.; Gilmore, I. S.; Winograd, N.; Miyayama, T.; Niehuis, E.; Rading, D.; Möllers, R. Argon Cluster Ion Beams for Organic Depth Profiling: Results from a VAMAS Interlaboratory Study Anal. Chem. 2012, 84, 7865-7873
-
(2012)
Anal. Chem.
, vol.84
, pp. 7865-7873
-
-
Shard, A.G.1
Havelund, R.2
Seah, M.P.3
Spencer, S.J.4
Gilmore, I.S.5
Winograd, N.6
Miyayama, T.7
Niehuis, E.8
Rading, D.9
Möllers, R.10
-
30
-
-
84872873714
-
Analysis of Organic Multilayers and 3D Structures Using Ar Cluster Ions
-
Niehuis, E.; Möllers, R.; Rading, D.; Cramer, H.-G.; Kersting, R. Analysis of Organic Multilayers and 3D Structures Using Ar Cluster Ions Surf. Interface Anal. 2013, 45, 158-162
-
(2013)
Surf. Interface Anal.
, vol.45
, pp. 158-162
-
-
Niehuis, E.1
Möllers, R.2
Rading, D.3
Cramer, H.-G.4
Kersting, R.5
-
31
-
-
78951493064
-
Cluster Primary Ion Sputtering: Correlations in Secondary Ion Intensities in TOF SIMS
-
Seah, M. P.; Gilmore, I. S. Cluster Primary Ion Sputtering: Correlations in Secondary Ion Intensities in TOF SIMS Surf. Interface Anal. 2010, 43, 228-235
-
(2010)
Surf. Interface Anal.
, vol.43
, pp. 228-235
-
-
Seah, M.P.1
Gilmore, I.S.2
-
34
-
-
33947679149
-
Size Effect in Cluster Collision on Solid Surfaces
-
Matsuo, J.; Ninomiya, S.; Nakata, Y.; Ichiki, K.; Aoki, T.; Seki, T. Size Effect in Cluster Collision on Solid Surfaces Nucl. Instrum. Methods, Sect. B 2007, 257, 627-631
-
(2007)
Nucl. Instrum. Methods, Sect. B
, vol.257
, pp. 627-631
-
-
Matsuo, J.1
Ninomiya, S.2
Nakata, Y.3
Ichiki, K.4
Aoki, T.5
Seki, T.6
-
35
-
-
0000984103
-
Sputtering Yield Measurements
-
Sputtering by Particle Bombardment i Physical Sputtering of Single-Element Solids Behrisch, R. Springer: Berlin, Chapter 4
-
Andersen, H. H.; Bay, H. L. Sputtering Yield Measurements. Sputtering by Particle Bombardment I Physical Sputtering of Single-Element Solids; Topics in Applied Physics Vol. 47; Behrisch, R., Ed.; Springer: Berlin, 1981; Chapter 4, pp 145-218.
-
(1981)
Topics in Applied Physics
, vol.47
, pp. 145-218
-
-
Andersen, H.H.1
Bay, H.L.2
-
36
-
-
0040164266
-
Sputtering Yields of Single Crystalline Targets
-
Sputtering by Particle Bombardment i Physical Sputtering of Single-Element Solids; Behrisch, R. Springer: Berlin, Chapter 5
-
Roosendaal, H. E. Sputtering Yields of Single Crystalline Targets. Sputtering by Particle Bombardment I Physical Sputtering of Single-Element Solids; Topics in Applied Physics Vol. 47; Behrisch, R., Ed.; Springer: Berlin, 1981; Chapter 5, pp 219-256.
-
(1981)
Topics in Applied Physics
, vol.47
, pp. 219-256
-
-
Roosendaal, H.E.1
-
37
-
-
0031546165
-
Incident Angle Dependence of the Sputtering Effect of Ar-Cluster-Ion Bombardment
-
Kitani, H.; Toyoda, N.; Matsuo, J.; Yamada, I. Incident Angle Dependence of the Sputtering Effect of Ar-Cluster-Ion Bombardment Nucl. Instrum. Methods, Sect. B 1997, 121, 489-492
-
(1997)
Nucl. Instrum. Methods, Sect. B
, vol.121
, pp. 489-492
-
-
Kitani, H.1
Toyoda, N.2
Matsuo, J.3
Yamada, I.4
-
38
-
-
3042549947
-
60 and Ga Bombardment
-
60 and Ga Bombardment J. Phys. Chem. B 2004, 108, 7831-7838
-
(2004)
J. Phys. Chem. B
, vol.108
, pp. 7831-7838
-
-
Postawa, Z.1
Czerwinski, B.2
Szewczyk, M.3
Smiley, E.J.4
Winograd, N.5
Garrison, B.J.6
-
39
-
-
55349100137
-
Angle of Incidence Effects in a Molecular Solid
-
Ryan, K. E.; Smiley, E. J.; Winograd, N.; Garrison, B. J. Angle of Incidence Effects in a Molecular Solid Appl. Surf. Sci. 2008, 255, 844-846
-
(2008)
Appl. Surf. Sci.
, vol.255
, pp. 844-846
-
-
Ryan, K.E.1
Smiley, E.J.2
Winograd, N.3
Garrison, B.J.4
-
40
-
-
40149108596
-
Physical and Chemical Sputterings of Solid Surfaces Irradiated by Ethanol Cluster Ion Beams
-
Takaoka, G. H.; Kawashita, M.; Okada, T. Physical and Chemical Sputterings of Solid Surfaces Irradiated by Ethanol Cluster Ion Beams Rev. Sci. Instrum. 2008, 79, 02C503-1-3
-
(2008)
Rev. Sci. Instrum.
, vol.79
-
-
Takaoka, G.H.1
Kawashita, M.2
Okada, T.3
-
41
-
-
79959248992
-
Effect of Impact Angle and Projectile Size on Sputtering Efficiency of Solid Benzene Investigated by Molecular Dynamics Simulations
-
Czerwinski, B.; Rzeznik, L.; Paruch, R.; Garrison, B. J.; Postawa, Z. Effect of Impact Angle and Projectile Size on Sputtering Efficiency of Solid Benzene Investigated by Molecular Dynamics Simulations Nucl. Instrum. Methods, Sect. B 2011, 269, 1578-1581
-
(2011)
Nucl. Instrum. Methods, Sect. B
, vol.269
, pp. 1578-1581
-
-
Czerwinski, B.1
Rzeznik, L.2
Paruch, R.3
Garrison, B.J.4
Postawa, Z.5
-
42
-
-
79959284116
-
Erosion of Ag Surface by Continuous Irradiation with Slow, Large Ar Clusters
-
Rzeznik, L.; Paruch, R.; Garrison, B. J.; Postawa, Z. Erosion of Ag Surface by Continuous Irradiation with Slow, Large Ar Clusters Nucl. Instrum. Methods, Sect. B 2011, 269, 1586-1590
-
(2011)
Nucl. Instrum. Methods, Sect. B
, vol.269
, pp. 1586-1590
-
-
Rzeznik, L.1
Paruch, R.2
Garrison, B.J.3
Postawa, Z.4
-
43
-
-
3643090763
-
Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets
-
Sigmund, P. Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets Phys. Rev. 1969, 184, 383-416
-
(1969)
Phys. Rev.
, vol.184
, pp. 383-416
-
-
Sigmund, P.1
-
44
-
-
84856108928
-
Topography Effects and Monatomic Ion Sputtering of Undulating Surfaces, Particles and Large Nanoparticles: Sputtering Yields, Effective Sputter Rates and Topography Evolution
-
Seah, M. P. Topography Effects and Monatomic Ion Sputtering of Undulating Surfaces, Particles and Large Nanoparticles: Sputtering Yields, Effective Sputter Rates and Topography Evolution Surf. Interface Anal. 2012, 44, 208-218
-
(2012)
Surf. Interface Anal.
, vol.44
, pp. 208-218
-
-
Seah, M.P.1
-
45
-
-
68849097091
-
Dynamics of Molecular Impacts on Soft Materials: From Fullerenes to Organic Nanodrops
-
Delcorte, A.; Garrison, B. J.; Hamraoul, K. Dynamics of Molecular Impacts on Soft Materials: From Fullerenes to Organic Nanodrops Anal. Chem. 2009, 81, 6676-6686
-
(2009)
Anal. Chem.
, vol.81
, pp. 6676-6686
-
-
Delcorte, A.1
Garrison, B.J.2
Hamraoul, K.3
-
46
-
-
84872865224
-
Dynamics of Large Ar Cluster Bombardment of Organic Solids
-
Postawa, Z.; Paruch, R.; Rzeznik, L.; Garrison, B. J. Dynamics of Large Ar Cluster Bombardment of Organic Solids Surf. Interface Anal. 2013, 45, 35-38
-
(2013)
Surf. Interface Anal.
, vol.45
, pp. 35-38
-
-
Postawa, Z.1
Paruch, R.2
Rzeznik, L.3
Garrison, B.J.4
|