Topography effects and monatomic ion sputtering of undulating surfaces, particles and large nanoparticles: Sputtering yields, effective sputter rates and topography evolution

Surface and Interface Analysis

Volumn 44, Issue 2, 2012, Pages 208-218

  Seah, M P ^a  

^a NATIONAL PHYSICAL LABORATORY   (United Kingdom)

Author keywords

depth resolution; particles; sputter depth profiles; sputtering; sputtering yield; topography

Indexed keywords

ANGULAR DEPENDENCE; DEPTH RESOLUTION; INDIVIDUAL ION; ION SPUTTERING; LAYERED STRUCTURES; NORMAL INCIDENCE; PRIMARY IONS; REDEPOSITION; SAMPLE ROTATION; SOLID TARGETS; SPHERICAL PARTICLE; SPUTTER DEPTH; SPUTTER RATE; SPUTTERING RATE; SPUTTERING YIELD; SPUTTERING YIELDS; TOPOGRAPHIC CHANGES; TOPOGRAPHIC EFFECTS; TOPOGRAPHICAL CHANGES; TOPOGRAPHY EFFECTS;

ELEMENTARY PARTICLES; IONS; ROTATION; SURFACES; TOPOGRAPHY;

SPUTTERING;

EID: 84856108928     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3798     Document Type: Article

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