Dual beam depth profiling of polymer materials: Comparison of C 60 and Ar cluster ion beams for sputtering

Surface and Interface Analysis

Volumn 45, Issue 1, 2013, Pages 171-174

  Rading, D ^a   Moellers, R ^a   Cramer, H G ^a   Niehuis, E ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

Ar clusters; Bin; C60; dual beam mode; organic depth profiling; polymers; TOF SIMS; total sputter yield

Indexed keywords

C60; DUAL BEAM; ORGANIC DEPTH PROFILING; SPUTTER YIELDS; TOF SIMS;

DEPTH PROFILING; ORGANIC POLYMERS; POLYMERS; SECONDARY ION MASS SPECTROMETRY; SPUTTERING;

ARGON;

EID: 84872856321     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.5122     Document Type: Conference Paper

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