Full field electron spectromicroscopy applied to ferroelectric materials

Journal of Applied Physics

Volumn 113, Issue 18, 2013, Pages

  Barrett, N ^a   Rault, J E ^a   Wang, J L ^a   Mathieu, C ^a   Locatelli, A ^b   Mentes, T O ^b   Nino M A ^c   Fusil, S ^d   Bibes, M ^e   Barthelemy A ^e   Sando, D ^e   Ren, W ^f,g   Prosandeev, S ^f   Bellaiche, L ^f   Vilquin, B ^h   Petraru, A ⁱ   Krug, I P ^j   Schneider, C M ^j  

^a les Atomes et les Molecules   (France)

^b SINCROTRONE TRIESTE   (Italy)

^c INSTITUTO MADRILEÑO DE ESTUDIOS AVANZADOS EN NANOCIENCIA IMDEA NANOCIENCIA   (Spain)

^d UNIVERSITÉ D EVRY VAL D ESSONNE   (France)

^e ECOLE POLYTECHNIQUE   (France)

^f UNIVERSITY OF ARKANSAS   (United States)

^g SHANGHAI UNIVERSITY   (China)

^h ECOLE CENTRALE DE LYON   (France)

ⁱ UNIVERSITY OF KIEL   (Germany)

^j FORSCHUNGSZENTRUM JÜLICH   (Germany)

more..

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERED ELECTRONS; CHEMICAL MAPPING; ELECTRON SPECTROMICROSCOPY; LOW ENERGY ELECTRON MICROSCOPY; PHOTOEMISSION ELECTRON MICROSCOPY; RECIPROCAL SPACE; SPATIAL RESOLUTION; SURFACE CRYSTALLINITY;

ELECTRON MICROSCOPES; ELECTRON MICROSCOPY; FERROELECTRIC THIN FILMS; SURFACE TOPOGRAPHY;

FERROELECTRIC MATERIALS;

EID: 84878061146     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4801968     Document Type: Article

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