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Ultramicroscopy

Volumn 110, Issue 7, 2010, Pages 852-861

A new aberration-corrected, energy-filtered LEEM/PEEM instrument. I. Principles and design

(6) Tromp, R M a Hannon, J B a Ellis, A W a Wan, W b Berghaus, A c Schaff, O c

a IBM T J WATSON RESEARCH CENTER (United States)

b LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

c SPECS SURFACE NANO ANALYSIS GMBH (Germany)

Author keywords

Aberration correction; Low energy electron microscopy; Photo electron emission microscopy; Resolution

Indexed keywords

ABERRATION CORRECTION; ELECTRON ENERGIES; ELECTRON MIRRORS; FOCAL LENGTHS; IN-LINE; INDEPENDENT CONTROL; LOW ENERGY ELECTRON MICROSCOPES; LOW ENERGY ELECTRON MICROSCOPY; NEW DESIGN; OBJECTIVE LENS; PHOTO-ELECTRON EMISSION; PHOTOELECTRON EMISSION MICROSCOPY; PRISM ARRAY; SPHERICAL ABERRATION COEFFICIENTS; SPHERICAL ABERRATIONS;

ABERRATIONS; BALLOONS; DESIGN; ELECTRON BEAMS; ELECTRONS; ELECTROSTATIC LENSES; GEOMETRICAL OPTICS; MAGNETIC MIRRORS; MICROSCOPES; MIRRORS; OPTICAL INSTRUMENT LENSES; SCANNING ELECTRON MICROSCOPY;

ELECTRON EMISSION;

ARTICLE; DISPERSION; ELECTRON BEAM; ELECTRON MICROSCOPY; EQUIPMENT DESIGN; IMAGE PROCESSING; LOW ENERGY ELECTRON MICROSCOPY; MECHANICS; OPTICAL RESOLUTION; PERFORMANCE MEASUREMENT SYSTEM; PHOTO ELECTRON EMISSION MICROSCOPY; PRISM; PROCESS DESIGN; STATIC ELECTRICITY; THEORETICAL STUDY;

EID: 77953535925 PISSN: 03043991 EISSN: None Source Type: Journal
DOI: 10.1016/j.ultramic.2010.03.005 Document Type: Article

Times cited : (167)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.