Applications of high lateral and energy resolution imaging XPS with a double hemispherical analyser based spectromicroscope

Journal of Electron Spectroscopy and Related Phenomena

Volumn 178-179, Issue C, 2010, Pages 303-316

  Escher, M ^a   Winkler, K ^b   Renault, O ^c   Barrett, N ^d  

^a Focus GmbH   (Germany)

^b Omicron Nanotechnology GmbH   (Germany)

^c CEA GRENOBLE   (France)

^d les Atomes et les Molecules   (France)

Author keywords

ESCA; Imaging XPS; PEEM; Photoelectron spectroscopy; Photoemission microscopy; Spectromicroscopy; Synchrotron radiation; Work function

Indexed keywords

CHEMICAL IMAGING; CORE-LEVEL ELECTRONS; DESIGN AND APPLICATION; ENERGY RESOLUTIONS; ESCA; HIGH RESOLUTION; HIGH TRANSMISSION; HIGHEST RESOLUTIONS; LATERAL RESOLUTION; PHOTOELECTRON EMISSION MICROSCOPY; PHOTOEMISSION MICROSCOPY; SPECTROMICROSCOPY; SPHERICAL ABERRATIONS; ULTRA-VIOLET LIGHT; X-RAY SOURCES; XPS;

EMISSION SPECTROSCOPY; PHOTOELECTRONS; PHOTOEMISSION; PHOTOIONIZATION; PHOTONS; SYNCHROTRON RADIATION; SYNCHROTRONS; WORK FUNCTION;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77951023691     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2009.06.001     Document Type: Article

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