Tilt of the columnar microstructure in off-normally deposited thin films using highly ionized vapor fluxes

Journal of Applied Physics

Volumn 113, Issue 17, 2013, Pages

  Elofsson, V ^a   Magnfalt D ^a   Samuelsson, M ^b   Sarakinos, K ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b Impact Coatings   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

COLUMNAR MICROSTRUCTURES; DEPOSITION FLUXES; DEPOSITION TECHNIQUE; ELEVATED TEMPERATURE; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); IONIZATION DEGREE; NUCLEATION STAGES; PHENOMENOLOGICAL MODELS;

DEPOSITS; IONIZATION; MICROSTRUCTURE; NUCLEATION; THIN FILMS; VAPOR DEPOSITION;

VAPORS;

EID: 84877760849     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4804066     Document Type: Conference Paper

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