Fabrication of 2D-3D photonic crystal heterostructures by glancing angle deposition

Photonics and Nanostructures - Fundamentals and Applications

Volumn 7, Issue 2, 2009, Pages 76-84

  Summers, M A ^a   Tabunshchyk, K ^b   Kovalenko, A ^b   Brett, M J ^a,b  

^a UNIVERSITY OF ALBERTA   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

Glancing angle deposition; Photonic crystal heterostructure; Silicon; Square spiral; Thin film deposition

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; D REGION; DEPOSITION; DETERIORATION; FABRICATION; HETEROJUNCTIONS; LIGHT REFLECTION; PHOTODEGRADATION; PHOTONIC CRYSTALS; REFLECTION; SEMICONDUCTING SILICON COMPOUNDS; THIN FILM DEVICES; THIN FILMS;

2D LAYERS; 3D PHOTONIC CRYSTALS; DEFECT MODES; FINITE DIFFERENCE TIME DOMAINS; GLANCING ANGLE DEPOSITION; HETEROSTRUCTURES; LIGHT INCIDENCES; NORMAL INCIDENCES; PHOTONIC BANDS; REFLECTANCE PEAKS; REFLECTION PEAKS; REFLECTION PROPERTIES; SCATTERING LOSS; SIMULATED SPECTRUM; SPIRAL GEOMETRIES; SPIRAL STRUCTURES; SQUARE SPIRAL; THIN FILM DEPOSITION;

PHOTONIC BAND GAP;

EID: 63149147243     PISSN: 15694410     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.photonics.2008.12.001     Document Type: Article

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