Effect of the oxidation temperature on microstructure and conductivity of Zn x N y thin films and their conversion into p-type ZnO:N films

Applied Surface Science

Volumn 271, Issue , 2013, Pages 70-76

  Erdogan, N H ^a   Kara, K ^a   Ozdamar, H ^a   Esen, R ^a   Kavak, H ^a  

^a CUKUROVA UNIVERSITY   (Turkey)

Author keywords

Filtered cathodic vacuum arc; Oxidation; p type ZnO; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONDUCTIVE FILMS; DEPOSITION; HALL MOBILITY; HOLE CONCENTRATION; HOLE MOBILITY; II-VI SEMICONDUCTORS; METALLIC FILMS; MICROSTRUCTURE; NITROGEN PLASMA; OXIDATION; SUBSTRATES; VACUUM APPLICATIONS; VACUUM TECHNOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

AIR ATMOSPHERE; CONDUCTION TYPE; FILTERED CATHODIC VACUUM ARC; FILTERED CATHODIC VACUUM ARC DEPOSITION; GLASS SUBSTRATES; OXIDATION TEMPERATURE; P TYPE ZNO; X RAY PHOTOEMISSION SPECTROSCOPY;

THIN FILMS;

EID: 84875369748     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2013.01.076     Document Type: Article

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