Temperature effect on the electrical, structural and optical properties of N-doped ZnO films by plasma-free metal organic chemical vapor deposition

Applied Surface Science

Volumn 255, Issue 12, 2009, Pages 6201-6204

  Zhu, Ying ^a   Lin, Shisheng ^a   Zhang, Yinzhu ^a   Ye, Zhizhen ^a   Lu, Yangfan ^a   Lu, Jianguo ^a   Zhao, Binghui ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

N doped; p type; Thin films; ZnO

Indexed keywords

DOPING (ADDITIVES); II-VI SEMICONDUCTORS; INDUSTRIAL CHEMICALS; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL PROPERTIES; ORGANIC CHEMICALS; ORGANOMETALLICS; THIN FILMS; X RAY DIFFRACTION; ZINC OXIDE;

COMPENSATION EFFECTS; CONDUCTION TYPE; N-DOPED; P-TYPE; STRUCTURAL AND OPTICAL PROPERTIES; SUBSTRATE TEMPERATURE; TEMPERATURE DEPENDENT; X-RAY DIFFRACTION MEASUREMENTS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 62349109005     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.01.077     Document Type: Article

References (29)

1. Zeng Y.J., Ye Z.Z., Xu W.Z., Li D.Y., Lu J.G., Zhu L.P., and Zhao B.H. Appl. Phys. Lett. 88 (2006) 062107
2. Lin S.S., Ye Z.Z., Lu J.G., He H.P., Chen L.X., Gu X.Q., Huang J.Y., Zhu L.P., and Zhao B.H. J. Phys. D: Appl. Phys. 41 (2008) 155114
3. Tsukazaki A., Ohtomo A., Onuma T., Ohtani M., Makino T., Sumiya M., Ohtani K., Chichibu S., Fuke S., Segawa Y., Ohno H., Koinuma H., and Kawasaki M. Nat. Mater. 4 (2005) 42
4. Xu W.Z., Ye Z.Z., Zeng Y.J., Zhu L.P., Zhao B.H., Jiang L., Lu J.G., He H.P., and Zhang S.B. Appl. Phys. Lett. 88 (2006) 173506
5. Aoki T., Hatanaka Y., and Look D.C. Appl. Phys. Lett. 76 (2000) 3257
6. Lim J.-H., Kang C.-K., Kim K.-K., Park I.-K., Hwang D.-K., and Park S.-J. Adv. Mater. (Weinheim, Germany) 18 (2006) 2720
7. Kim H.-S., Lugo F., Pearton S.J., Norton D.P., Wang Y.-Lin., and Ren F. Appl. Phys. Lett. 92 (2008) 112108
8. Ryu Y.R., Lubguban J.A., Lee T.S., White H.W., Jeong T.S., Youn C.J., and Kim B.J. Appl. Phys. Lett. 90 (2007) 131115
9. Chu S., Lim J.H., Mandalapu L.J., Yang Z., Li L., and Liu J.L. Appl. Phys. Lett. 92 (2008) 152103
10. Nakumura S., Senoh M., Nagahama S., Iwasa N., and Matsushita T. Appl. Phys. Lett. 76 (2000) 22
11. Zeng Y.J., Ye Z.Z., Lu Y.F., Xu W.Z., Zhu L.P., Huang J.Y., He H.P., and Zhao B.H. J. Phys. D: Appl. Phys. 41 (2008) 165104
12. Lin S.S., Lu J.G., Ye Z.Z., He H.P., Gu X.Q., Chen L.X., Huang J.Y., and Zhao B.H. Solid State. Commun. 148 (2008) 25
13. Look D.C. Semicond. Sci. Technol. 20 (2005) S55
14. Yuan G.D., Ye Z.Z., Zhu L.P., Qian Q., and Zhao B.H. Appl. Phys. Lett. 86 (2005) 202106
15. Xu W.Z., Ye Z.Z., Jiang L., Zeng Y.J., Zhu L.P., and Zhao B.H. Appl. Surf. Sci. 252 (2006) 5926
16. Barnes T.M., Olson K., and Wolden C.A. Appl. Phys. Lett. 86 (2005) 112112
17. Petruzzello J., and Gaines J. Appl. Phys. Lett. 62 (1993) 1496
18. Tsukazaki A., Saito H., Tamura K., Ohtani M., and Koinuma H. Appl. Phys. Lett. 81 (2002) 235
19. Sumiya M., Fuke S., Tsukazaki A., Tamura K., Ohtomo A., Kawasaki M., and Koinuma H. J. Appl. Phys. 93 (2003) 2562
20. Jiao S.J., Lu Y.M., Zhang Z.Z., Li B.H., Yao B., Zhang J.Y., Zhao D.X., Shen D.Z., and Fan X.W. J. Appl. Phys. 102 (2007) 113509
21. Lee E.-C., Kim Y.-S., Jin Y.-G., and Chang K.J. Phys. Rev. B 64 (2001) 085120
22. Limpijumnong S., Li X.N., Wei S.H., and Zhang S.B. Appl. Phys. Lett. 86 (2005) 211910
23. Look D.C., Farlow G.C., Reunchan P., Limpijumnong S., Zhang S.B., and Nordlund K. Phys. Rev. Lett. 95 (2005) 225502
24. Xiong G., Ucer K.B., and Williams R.T. J. Appl. Phys. 97 (2005) 043528
25. Sun J.W., Lu Y.M., Liu Y.C., Shen D.Z., Zhang Z.Z., Yao B., Li B.H., Zhang J.Y., Zhao D.X., and Fan X.W. J. Appl. Phys. 102 (2007) 043522
26. Maki H., Sakaguchi I., Ohashi N., Sekiguchi S., Haneda H., Tanaka J., and Ichinose N. Jpn. J. Appl. Phys. Part 1 42 (2003) 75
27. Wei Z.P., Yao B., Zhang Z.Z., Lu Y.M., Shen D.Z., Li B.H., Wang X.H., Zhang J.Y., Zhao D.X., Fan X.W., and Tang Z.K. Appl. Phys. Lett. 89 (2006) 102104
28. Zeuner A., Alves H., Hofmann D.M., Meyer B.K., Hoffmann A., Haboeck U., Strassburg M., and Dworzak M. Phys. Status. Solidi. B 234 (2002) R7-R9
29. Allenic A., Guo W., Chen Y.B., Katz M.B., Zhao G.Y., Che Y., Hu Z.D., Liu B., and Zhang S.B. Adv. Mater. 19 (2007) 3333