Variation of surface properties of ZnO films by the implantation of N + ions

Thin Solid Films

Volumn 492, Issue 1-2, 2005, Pages 236-239

  Wang, Haiyan ^a   Gao, Xiaoyong ^a   Duan, Qiliang ^a   Lu, Jingxiao ^a  

^a Zheng Zhou University   (China)

Author keywords

N+ ions implantation; Rapid thermal annealing; Reactive magnetron sputtering; Surface morphology

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC CONDUCTIVITY; GLASS; ION IMPLANTATION; MAGNETRON SPUTTERING; MORPHOLOGY; NITROGEN; RAPID THERMAL ANNEALING; SURFACE PROPERTIES; SURFACE ROUGHNESS; SURFACES; X RAY DIFFRACTION; ZINC OXIDE;

COOL-HOT PROBE POINT; FOUR-POINT PROBE METHOD; N+ ION IMPLANTATION; REACTIVE MAGNETRON SPUTTERING;

THIN FILMS;

EID: 25644459429     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.06.062     Document Type: Article

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