Characterization of ultrathin electroless barriers grown by self-aligned deposition on silicon-based dielectric films

Journal of the Electrochemical Society

Volumn 151, Issue 10, 2004, Pages

  Chen, S T ^a   Chen, G S ^a  

^a FENG CHIA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CATALYSIS; CRYSTALLIZATION; ELECTROCHEMISTRY; ELECTROLESS PLATING; FILM GROWTH; SILICON; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY SPECTROSCOPY;

GRAZING INCIDENCE X-RAY DIFFRACTOMETRY; ULTRATHIN BARRIERS; X-RAY ABSORPTION SPECTROSCOPY;

DIELECTRIC FILMS;

EID: 8644263222     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1786072     Document Type: Article

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