Sputter power and sputter pressure influenced structural and optical behaviour of RF sputtered nanocrystalline ZnO films

Crystal Research and Technology

Volumn 47, Issue 10, 2012, Pages 1095-1104

  Reddy, R Subba ^a   Reddy, A Sivasankar ^b   Radhakrishna, B ^c   Uthanna, S ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b Kongju National University   (South Korea)

^c Department of Physics   (India)

Author keywords

optical properties; sputter power; sputter pressure; structure; thin films; zinc oxide

Indexed keywords

CORNING GLASS; DEPOSITED FILMS; FOURIER TRANSFORM INFRARED; FTIR ANALYSIS; NANOCRYSTALLINE ZNO; OPTICAL BEHAVIOUR; P-TYPE; RF-MAGNETRON SPUTTERING; ROOT MEAN SQUARE ROUGHNESS; SPUTTER POWER; SPUTTER PRESSURE; SPUTTERING POWER; UV-VIS-NIR SPECTROPHOTOMETERS; WORKING PRESSURES; ZINC OXIDE THIN FILMS; ZNO;

ATOMIC FORCE MICROSCOPY; DEPOSITS; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; STRUCTURE (COMPOSITION); SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; ZINC OXIDE;

OXIDE FILMS;

EID: 84867051053     PISSN: 02321300     EISSN: 15214079     Source Type: Journal    
DOI: 10.1002/crat.201200150     Document Type: Article

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