Effect of gas-timing technique on structure and optical properties of sputtered zinc oxide films

Ceramics International

Volumn 34, Issue 4, 2008, Pages 1103-1107

  Klaitabtim, Don ^a   Pratontep, Sirapat ^b   Nukeaw, Jiti ^a  

^a Faculty of Science   (Thailand)

^b NATIONAL SCIENCE AND TECHNOLOGY DEVELOPMENT AGENCY   (Thailand)

Author keywords

A. Films; B. Grain size; C. Optical properties; Zinc oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; HEAT TREATMENT; MAGNETRON SPUTTERING; OPACITY; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

GAS TIMING TECHNIQUES; SPUTTERING CHAMBERS; WURTZITE STRUCTURES;

OXIDE FILMS;

EID: 42649122314     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2007.09.100     Document Type: Article

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