Structural studies of room-temperature RF magnetron sputtered ZnO films under different RF powered conditions

Materials Science and Engineering: B

Volumn 103, Issue 3, 2003, Pages 297-302

  Kim, Hyoun Woo ^a   Kim, Nam Ho ^a  

^a Inha University   (South Korea)

Author keywords

RF power; Room temperature; Thin film; ZnO

Indexed keywords

ATOMIC FORCE MICROSCOPY; MAGNETRON SPUTTERING; OPTIMIZATION; PLASMAS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CONDUCTING COATINGS;

ZINC OXIDE;

EID: 0141748276     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(03)00281-2     Document Type: Letter

References (17)

1. Yamamoto T., Shiosaki T., Kawabata A. J. Appl. Phys. 51:1980;3113.
2. Ondo-Ndong R., Pascal-Delannoy F., Boyer A., Giani A., Foucaran A. Mater. Sci. Eng. B. 97:2003;68.
3. Lee J.-H., Ko K.-H., Park B.-O. J. Cryst. Growth. 247:2003;119.
4. Ayouchi R., Martin F., Leinen D., Ramos-Barrado J.R. J. Cryst. Growth. 247:2003;497.
5. Lokhande B.J., Patil P.S., Uplane M.D. Mater. Lett. 57:2002;573.
6. Zeng J.N., Low J.K., Ren Z.M., Liew T., Lu Y.F. Appl. Surf. Sci. 197:2002;362.
7. Kim H., Horwitz J.S., Qadri S.B., Chrisey D.B. Thin Solid Films. 420:2002;107.
8. Whangbo S.W., Jang H.K., Kim S.G., Cho M.H., Jeong K.H., Whang C.N. J. Korean Phys. Soc. 37:2000;456.
9. Li B.S., Liu Y.C., Shen D.Z., Zhang J.Y., Lu Y.M., Fan X.Q. J. Cryst. Growth. 249:2003;179.
10. Yamada A., Sang B., Konagai M. Appl. Surf. Sci. 112:1997;216.
11. Xu X.L., Lau S.P., Chen J.S., Sun Z., Tay B.K., Chai J.W. Mater. Sci. Semicond. Proc. 4:2001;617.
12. Gordillo G., Calderon C. Solar Energy Mater. Solar Cells. 69:2001;251.
13. Du G., Wang J., Wang X., Jiang X., Yang S., Ma Y., Yan W., Gao D., Liu X., Cao H., Xu J., Chang R.P.H. J. Cryst. Growth. 243:2003;439.
14. Ye J., Gu S., Zhu S., Chen T., Hu L., Qin F., Zhang R., Shi Y., Zheng Y. J. Cryst. Growth. 243:2002;151.
15. Iwata K., Fons P., Niki S., Yamada A., Matsubara K., Nakahara K., Tanabe T., Takasu H. J. Cryst. Growth. 214/215:2000;50.
16. Guha S., Bojarczuk N.A. Appl. Phys. Lett. 73:1998;1487.
17. Lu Y.M., Hwang W.S., Liu W.Y., Yang J.S. Mater. Chem. Phys. 72:2001;269.