Optical and structural properties of pulsed laser ablation deposited ZnO thin film

Applied Surface Science

Volumn 257, Issue 6, 2011, Pages 2298-2302

  Fazio, E ^a   Mezzasalma, A M ^a,b   Mondio, G ^a,b   Serafino, T ^a   Barreca, F ^c   Caridi, F ^a  

^a UNIVERSITY OF MESSINA   (Italy)

^b INFN SEZIONE DI CATANIA   (Italy)

^c Advanced and Nano Materials Research srl   (Italy)

Author keywords

Pulsed laser ablation; Reflection electron energy loss spectroscopy; Thin films; Zinc oxide

Indexed keywords

ABLATION; DISSOCIATION; ELECTRON EMISSION; ELECTRON ENERGY LEVELS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRON SCATTERING; ENERGY DISSIPATION; II-VI SEMICONDUCTORS; LASER ABLATION; METALLIC FILMS; OPTICAL CORRELATION; OPTICAL FILMS; OPTICAL PROPERTIES; OXIDE FILMS; PULSED LASER DEPOSITION; THIN FILMS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

DEPOSITION PARAMETERS; DIELECTRIC FUNCTIONS; REFLECTION ELECTRON ENERGY LOSS SPECTROSCOPIES; STRUCTURAL AND OPTICAL PROPERTIES; SYSTEMATIC STUDY; ZNO THIN FILM;

PULSED LASERS;

EID: 78650302968     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.09.092     Document Type: Article

References (53)

1. J. Zhao, L.Z. Hu, Z. Wang, J. Sun, and Z. Wang Appl. Surf. Sci. 253 2006 841
2. C. Yan, and D. Xue J. Phys. Chem. B 110 2006 25850
3. C. Yan, and D. Xue Elettrochem. Commun. 9 2007 1247
4. B. Wen, Y. Huang, and J.J. Boland J. Phys. Chem. C 112 2008 106
5. T. Zhang, W. Dong, R.N. Njabon, V.K. Varadan, and Z. Ryan Tian J. Phys. Chem. C 111 2007 13691
6. X. Zhang, J. Song, and Z.L. Wang Chem. Phys. Lett. 424 2006 86
7. Y.R. Ryu, J.A. Lubguban, T.S. Lee, H.W. White, T.S. Jeong, C.J. Youn, and B.J. Kim Appl. Phys. Lett. 90 2007 131115
8. T. Gao, and T.H. Wang Appl. Phys. A 80 2005 1451
9. S. Anadan, A. Vinu, T. Mori, N. Gokulakrishnan, P. Srinivasu, V. Murugesan, and K. Ariga Catal. Commun. 8 2007 1377
10. X.L. Chen, B.H. Xu, J.M. Xue, Y. Zhao, C.C. Wei, J. Sun, Y. Wang, X.D. Zhang, and X.H. Geng Thin Solid Films 515 2007 3753
11. H. Chen, A.D. Pasquier, G. Saraf, J. Zhong, and Y. Lu Semicond. Sci. Technol. 23 2008 045004
12. Z.X. Xu, V.A.L. Roy, P. Stalling, M. Muccini, S. Toffanin, H.F. Xiang, and C.M. Che Phys. Lett. 90 2007 223509
13. K.M. Lin, and P. Tsai Thin Solid Films 515 2007 8601
14. M. Lv, X. Xiu, Z. Phang, Y. Dai, L. Ye, C. Cheng, and S. Han Thin Solid Films 516 2008 2017
15. P. Kung, A. Saxler, X. Zhang, D. Walker, T.C. Wang, I. Ferguson, and M. Razeghi Appl. Phys. Lett. 66 1995 2958
16. T.M. Barnes, J. Leaf, C. Fry, and C.A. Wolden J. Cryst. Growth 274 2005 421
17. T.Y. Ma, and S.C. Lee J. Mater. Electron. 11 2000 305
18. O. Pagni, N.N. Somhlahlo, C. Weichsel, and A.W.R. Leitch Physica B 376-377 2006 749
19. W. Qian, M. Skowronsky, M.D. Graef, K. Doverspike, L.B. Rowland, and D.K. Gaskill Appl. Phys. Lett. 66 1995 1252
20. M.A. Khan, R.A. Skogman, J.M. Van Hove, D.T. Olson, and J.N. Kuznia Appl. Phys. Lett. 60 1992 1366
21. N.H. Karam, T. Parodos, P. Colter, D. Mcnulty, W. Rowland, J. Schetzina, N. El-Masry, and S.M. Bedair appl. Phys. Lett. 67 1995 94
22. E.M. Kaidashev, M. Lorenz, H.V. Wenckstern, A. Rahm, H.C. Semmelhack, K.H. Han, G. Benndorf, C. Bundesmann, H. Hochmuth, and M. Grundmann Appl. Phys. Lett. 82 2003 3901
23. V. Cracium, J. Elders, J.G.E. Gardeniers, and J.W. Boyd Appl. Phys. Lett. 65 1994 2963
24. S.L. King, J.G.E. Gardeniers, and I.W. Boyd Appl. Surf. Sci. 96-98 1996 811
25. K. Saito, Y. Watanabe, K. Takahashi, T. Matsuzawa, B. Sang, and M. Konagai Sol. Energy Mater. Sol. Cell 49 1997 187
26. W. Water, and S.Y. Chu Mater. Lett. 55 2002 67
27. T. Shimomura, D. Kim, and M. Nakayama J. Lumin. 112 2005 191
28. F.K. Shan, and Y.S. Yu Thin Solid Films 435 2003 174
29. S.-M. Park, T. Ikegami, K. Ebihara, and P.-K. Shin Appl. Surf. Sci. 253 2006 1522
30. M. Hiramatsu, K. Imaeda, N. Horio, and M. Nawata J. Vac. Sci. Technol. A 16 1998 669
31. H. Kim, C.M. Gilmore, J.S. Horowitz, A. Pique, H. Murata, G.P. Kushto, R. Schlaf, Z.H. Kafafi, and D.B. Chrisey Appl. Phys. Lett. 76 2000 259
32. H. Kim, J.S. Horwitz, S.B. Qadri, and D.B. Chrisey Thin Solid Films 420-421 2002 107
33. E. Fazio, F. Neri, P.M. Ossi, N. Santo, and S. Trusso Laser Part. Beams 27 2009 281
34. B. Fazio, S. Trusso, E. Fazio, F. Neri, P.M. Ossi, and N. Santo Radiat. Effects Defects Solids 163 2008 673
35. S. Trusso, E. Barletta, F. Barreca, and F. Neri Appl. Phys. A: Mater. Sci. Process. 79 2004 1997
36. A.M. Mezzasalma, G. Mondio, T. Serafino, F. Caridi, and L. Torrisi Appl. Surf. Sci. 255 2009 4123
37. F. Caridi, L. Torrisi, A.M. Mezzasalma, G. Mondio, and A. Borrielli EPJ D 54 2 2009 467
38. J.F. Moulder, W.F. Stickle, P.E. Sobol, K.D. Bomben, Handbook of X-ray Photoelectron Spectroscopy, Published by Perkin-Elmer Corp., Eden Prairie, MN, USA, 1992.
39. M. Chen, X. Wang, Y.H. Yu, Z.L. Pei, X.D. Bai, C. Sun, R.F. Huang, and L.S. Wen Appl. Surf. Sci. 158 2000 134
40. K. Ogata, T. Komuro, K. Hama, K. Koike, S. Sasa, M. Inoue, and M. Yano Appl. Surf. Sci. 237 2004 348
41. Y. Liu, L. Zhao, and J. Lian Vacuum 81 2006 18
42. F.K. Shan, G.X. Liu, W.J. Lee, and B.C. Shin J. Appl. Phys. 101 2007 053106
43. S.C. Singh, and R. Gopal Physica E 40 2008 724
44. Y. Ishikawa, Y. Shimizu, T. Sasaki, and N. Koshizaki J. Colloid Interf. Sci. 300 2006 612
45. Y. Liu, and J. Lian Appl. Surf. Sci. 253 2007 3727
46. F.K. Shan, and Y.S. Yu J. Eur. Ceram. Soc. 24 2004 1869
47. I.S. Kim, E.K. Jeong, D.Y. Kim, M. Kumar, and S.Y. Choi Appl. Surf. Sci. 255 7 2009 4011
48. X.M. Fan, J.S. Lian, Z.X. Guo, and H.J. Lu Appl. Surf. Sci. 239 2005 176
49. B.L. Zhu, X.Z. Xhao, S. Xu, F.H. Su, G.H. Li, X.G. Wu, J. Wu, R. Wu, and J. Liu Jpn. J. Appl. Phys. 47 4 2008 2225
50. E.L. Papadopoulou, M. Varda, K. Kouroupis-Agalou, M. Androulidaki, E. Chikoidze, P. Galtier, G. Huyberechts, and E. Aperathitis Thin Solid Films 518 4 2008 1267
51. S. Venkatachalam, and Y. Kanno Curr. Appl. Phys. 9 2009 1232
52. Z.H. Zhang, Ming He, and Quan Li Solid State Commun. 14 2009 1856
53. Z.H. Zhang, X.Y. Qi, J.K. Jian, and X.F. Duan Micron 37 2006 229