Comparative study of zinc oxide and aluminum doped zinc oxide transparent thin films grown by direct current magnetron sputtering

Thin Solid Films

Volumn 515, Issue 16 SPEC. ISS., 2007, Pages 6562-6566

  Suchea, M ^a,b   Christoulakis, S ^a,b   Katsarakis, N ^a,c   Kitsopoulos, T ^a,b   Kiriakidis, G ^a,b  

^a INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^b UNIVERSITY OF CRETE   (Greece)

^c Technological Educational Institute (TEI) of Crete   (Greece)

Author keywords

dc magnetron sputtering; Sensors; Surface morphology; Zinc oxide

Indexed keywords

ENERGY GAP; FILM GROWTH; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR DOPING; TRANSPARENCY;

CRYSTALLINITY; DC MAGNETRON SPUTTERING; DIRECT CURRENT (DC); ROOM TEMPERATURE (RT);

THIN FILMS;

EID: 34247524120     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.151     Document Type: Article

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