Sintering behavior of nano- and micro-sized ZnO powder targets for rf magnetron sputtering applications

Journal of the American Ceramic Society

Volumn 95, Issue 1, 2012, Pages 204-210

  Neves, Nuno ^a,b   Barros, Raquel ^a,b   Antunes, Elsa ^a   Ferreira, Isabel ^b   Calado, João ^a   Fortunato, Elvira ^b   Martins, Rodrigo ^b  

^a INNOVNANO   (Portugal)

^b Center of Excellence in Microelectronics Optoelectronics and Processes   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION CONDITIONS; ELECTRICAL RESISTIVITY; FINAL DENSITY; GREEN DENSITIES; HIGH DENSITY; HIGH PURITY; INITIAL STAGES; MORPHOLOGICAL PROPERTIES; N VALUE; NANOMETRICS; NON-ISOTHERMAL SINTERING; NONSTOICHIOMETRIC; RF-MAGNETRON SPUTTERING; SCALE-UP EFFECTS; SHRINKAGE RATES; SINTERABILITY; SINTERING BEHAVIORS; SMALL GRAIN SIZE; SPUTTERING TARGET; THEORETICAL DENSITY; VOLUME DIFFUSION; ZNO; ZNO CERAMIC; ZNO FILMS; ZNO POWDER;

ACTIVATION ENERGY; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; POWDERS; SINTERING;

ZINC OXIDE;

EID: 84855354511     PISSN: 00027820     EISSN: 15512916     Source Type: Journal    
DOI: 10.1111/j.1551-2916.2011.04874.x     Document Type: Article

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