Effect of target properties on transparent conducting impurity-doped ZnO thin films deposited by DC magnetron sputtering

Thin Solid Films

Volumn 519, Issue 1, 2010, Pages 385-390

  Minami, Tadatsugu ^a   Oda, Jun Ichi ^a   Nomoto, Jun Ichi ^a   Miyata, Toshihiro ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

AZO; GZO; LCD; Magnetron sputtering; Thin film; Transparent conducting oxide; Transparent electrode; ZnO

Indexed keywords

AZO; GZO; LCD; TRANSPARENT CONDUCTING OXIDE; TRANSPARENT ELECTRODE; ZNO;

CONDUCTIVE FILMS; CRYSTAL IMPURITIES; FILM PREPARATION; GALLIUM; GALLIUM ALLOYS; LIQUID CRYSTAL DISPLAYS; LIQUID CRYSTALS; MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL FILMS; OXIDE FILMS; OXYGEN; SINTERING; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; ZINC OXIDE;

DEPOSITION;

EID: 77957692769     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.08.007     Document Type: Article

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