Optical, electrical and structural characteristics of Al:ZnO thin films with various thicknesses deposited by DC sputtering at room temperature and annealed in air or vacuum

Vacuum

Volumn 84, Issue 7, 2010, Pages 924-929

  Guillen C ^a   Herrero, J ^a  

^a CIEMAT   (Spain)

Author keywords

Annealing; Electrical resistance; Optical transmittance; Sputtering; Structure; ZnO

Indexed keywords

AFTER-TREATMENT; AL-DOPED ZNO; ANNEALING PARAMETERS; AS-GROWN; BAND GAP ENERGY; CRYSTALLINE LATTICE; DC SPUTTERING; ELECTRICAL RESISTANCES; HALL EFFECT MEASUREMENT; HEATING TEMPERATURES; HEXAGONAL STRUCTURES; IN-VACUUM; LATTICE DISTORTIONS; OPTICAL TRANSMITTANCE; POLYCRYSTALLINE; ROOM TEMPERATURE; SODA LIME GLASS SUBSTRATE; STRUCTURAL CHARACTERISTICS; STRUCTURE; UNIT CELLS; VISIBLE TRANSMITTANCE; ZNO; ZNO THIN FILM;

ALUMINUM; ANNEALING; BIOACTIVITY; CARRIER CONCENTRATION; CARRIER MOBILITY; CONDUCTIVE FILMS; ELECTRIC RESISTANCE; HALL EFFECT; HEATING; MAGNETIC FIELD EFFECTS; MAGNETIC FILMS; OPACITY; VACUUM; ZINC OXIDE;

ATMOSPHERIC TEMPERATURE;

EID: 76849083737     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.12.015     Document Type: Article

References (31)

1. Hao X.T., Zhu F.R., Ong K.S., and Tan L.W. Hydrogenated aluminium-doped zinc oxide semiconductor thin films for polymeric light-emitting diodes. Semicond Sci Technol 21 (2006) 48-54
2. Granqvist C.G. Transparent conductors as solar energy materials: a panoramic review. Sol Energ Mater Sol Cell 91 (2007) 1529-1598
3. Minami T. Present status of transparent conducting oxide thin-film development for Indium-Tin-Oxide (ITO) substitutes. Thin Solid Films 516 (2008) 5822-5828
4. Ellmer K. Magnetron sputtering of transparent conductive zinc oxide: relation between the sputtering parameters and the electronic properties. J Phys D Appl Phys 33 (2000) R17-R32
5. Haug F.J., Geller Z., Zogg H., Tiwari A.N., and Vignali C. Influence of deposition conditions on the thermal stability of ZnO: Al films grown by rf magnetron sputtering. J Vac Sci Technol A 19 (2001) 171-174
6. Chang J.F., and Hon M.H. The effect of deposition temperature on the properties of Al-doped zinc oxide thin films. Thin Solid Films 386 (2001) 79-86
7. Wang W.W., Diao X.G., Wang Z., Yang M., Wang T.M., and Wu Z. Preparation and characterization of high-performance direct current magnetron sputtered ZnO: Al films. Thin Solid Films 491 (2005) 54-60
8. Li W., Sun Y., Wang Y., Cai H., Liu F., and He Q. Effects of substrate temperature on the properties of facing-target sputtered Al-doped ZnO films. Sol Energy Mater Sol Cells 91 (2007) 659-663
9. Fang G.J., Li D., and Yao B.L. Influence of post-deposition annealing on the properties of transparent conductive nanocrystalline ZAO thin films prepared by RF magnetron sputtering with highly conductive ceramic target. Thin Solid Films 418 (2002) 156-162
10. Fang G.J., Li D., and Yao B.L. Fabrication and vacuum annealing of transparent conductive AZO thin films prepared by DC magnetron sputtering. Vacuum 68 (2003) 363-372
11. Lin S.S., Huang J.L., and Sajgalik P. The properties of heavily Al-doped ZnO films before and after annealing in the different atmosphere. Surf Coat Technol 185 (2004) 254-263
12. Moustaghfir A., Tomasella E., Ben Amor S., Jacquet M., Cellier J., and Sauvage T. Structural and optical studies of ZnO thin films deposited by rf. magnetron sputtering: influence of annealing. Surf Coat Technol 174-175 (2003) 193-196
13. Lin S.S., and Huang J.L. Effect of thickness on the structural and optical properties of ZnO films by rf. magnetron sputtering. Surf Coat Technol 185 (2004) 222-227
14. Minami T. Transparent conducting oxide semiconductors for transparent electrodes. Semicond Sci Technol 20 (2005) S35-S44
15. Banerjee A.N., Ghosh C.K., Chattopadhyay K.K., Minoura H., Sarkar A.K., Akiba A., et al. Low-temperature deposition of ZnO thin films on PET and glass substrates by DC-sputtering technique. Thin Solid Films 496 (2006) 112-116
16. Agashe C., Kluth O., Schöpe G., Siekmann H., Hüpkes J., and Rech B. Optimization of the electrical properties of magnetron sputtered aluminum-doped zinc oxide films for opto-electronic applications. Thin Solid Films 442 (2003) 167-172
17. He H.P., Zhuge F., Ye Z.Z., Zhu L.P., Wang F.Z., Zhao B.H., et al. Strain and its effect on optical properties of Al-N codoped ZnO films. J Appl Phys 99 (2006) 023503
18. Suchea M., Christoulakis S., Katsarakis N., Kitsopoulos T., and Kiriakidis G. Comparative study of zinc oxide and aluminum doped zinc oxide transparent thin films grown by direct current magnetron sputtering. Thin Solid Films 515 (2007) 6562-6566
19. Bouderbala M., Hamzaoui S., Adnane M., Sahraoui T., and Zerdali M. Annealing effect on properties of transparent and conducting ZnO thin films. Thin Solid Films 517 (2009) 1572-1576
20. Hamad O., Braunstein G., Patil H., and Dhere N. Effect of thermal treatment in oxygen, nitrogen, and air atmospheres on the electrical transport properties of zinc oxide thin films. Thin Solid Films 489 (2005) 303-309
21. Dagamseh A.M.K., Vet B., Tichelaar F.D., Sutta P., and Zeman M. ZnO: Al films prepared by rf magnetron sputtering applied as back reflectors in thin-film silicon solar cells. Thin Solid Films 516 (2008) 7844-7850
22. Powder diffraction file, Card 05-0664. Joint Committee on Powder Diffraction Standards-International Centre for Diffraction Data: Pennsylvania; 2003.
23. Gomi M., Oohira N., Ozaki K., and Koyano M. Photoluminescent and structural properties of precipitated ZnO fine particles. Jpn J Appl Phys 42 (2003) 481-485
24. Singh S., Srinivasa R.S., and Major S.S. Effect of substrate temperature on the structure and optical properties of ZnO thin films deposited by reactive rf magnetron sputtering. Thin Solid Films 515 (2007) 8718-8722
25. Pei Z.L., Zhang X.B., Zhang G.P., Gong J., Sun C., Huang R.F., et al. Transparent conductive ZnO: Al thin films deposited on flexible substrates prepared by direct current magnetron sputtering. Thin Solid Films 497 (2006) 20-23
26. Bellingham J.R., Phillips W.A., and Adkins C.J. Intrinsic performance limits in transparent conducting oxides. J Mater Sci Lett 11 (1992) 263-265
27. Ellmer K. Resistivity of polycrystalline zinc oxide films: current status and physical limit. J Phys D Appl Phys 34 (2001) 3097-3108
28. Ellmer K., and Mientus R. Carrier transport in polycrystalline transparent conductive oxides: a comparative study of zinc oxide and indium oxide. Thin Solid Films 516 (2008) 4620-4627
29. Ellmer K., and Mientus R. Carrier transport in polycrystalline ITO and ZnO: Al II: the influence of grain barriers and boundaries. Thin Solid Films 516 (2008) 5829-5835
30. Choi B.G., Kim I.H., Kim D.H., Lee K.S., Lee T.S., Cheong B., et al. Electrical, optical and structural properties of transparent and conducting ZnO thin films doped with Al and F by rf magnetron sputter. J Eur Ceram Soc 25 (2005) 2161-2165
31. 3 films: basic optical properties and applications to energy-efficient windows. J Appl Phys 60 (1986) R123