High quality Al-doped ZnO thin films deposited using targets prepared by chemical coprecipitation

Physica Status Solidi (A) Applications and Materials Science

Volumn 206, Issue 7, 2009, Pages 1461-1464

  Cai, L ^a   Jiang, G ^b   Zhu, C ^b   Wang, D ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZNO; ALUMINUM-DOPED ZINC OXIDE; AZO FILMS; AZO THIN FILMS; CHEMICAL CO-PRECIPITATION; CHEMICAL COPRECIPITATION METHOD; HIGH QUALITY; LIGHT TRANSMITTANCE; MECHANICAL GRINDING; SUBSTRATE TEMPERATURE; VISIBLE REGION; ZN ATOMS; ZNO;

ALUMINA; ALUMINUM; ATOMS; CELL MEMBRANES; COPRECIPITATION; DEPOSITION; LIGHT; OPTICAL FILMS; PULSED LASER DEPOSITION; SEMICONDUCTING ZINC COMPOUNDS; THIN FILMS; ZINC; ZINC OXIDE;

OXIDE FILMS;

EID: 67650496165     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200824416     Document Type: Article

References (18)

1. K. Matsubara, P. Fons, K. Iwata, A. Yamada, K. Sakurai, H. Tampo, and S. Niki, Thin Solid Films 431/432, 369 (2003).
2. M. Karger and M. Schilling, Phys. Rev. B 71, 075304 (2005).
3. H. Kim, C. M. Gilmore, J. S. Horwitz, A. Pique, H. Murata, G. P. Kushto, R. Schlaf, Z. H. Kafafi, and D. B. Chrisey, Appl. Phys. Lett. 76, 259 (2000).
4. H. Agura, A. Suzuki, T. Matsushita, T. Aoki, and M. Oku-dab, Thin Solid Films 445, 263 (2003).
5. A. V. Singh, R. M. Mehra, N. Buthrath, A. Wakahara, and A. Yoshida, J. Appl. Phys. 90, 5661 (2001).
6. G. J. Fang, D. J. Li, and B. L. Yao, Phys. Status Solidi A 193, 139 (2002).
7. J. Hu and R. G. Gordon, J. Appl. Phys. 71, 880 (1992).
8. A. F. Aktaruzzaman, G. L. Sharma, and L. K. Malhotra, Thin Solid Films 198, 67 (1991).
9. D. Goyal, P. Solanki, B. Maranthe, M. Takwale, and V. Bhide, Jpn. J. Appl. Phys. 31, 361 (1992).
10. H. Kim, A. Pique, J. S. Horwitz, H. Murata, Z. H. Kafafi, C. M. Gilmore, and D. B. Chrisey, Thin Solid Films 377/378, 798 (2000).
11. P. D. Nsimama, M. E. Samiji, G. W. Mbise, G. A. Niklas-son, J. Wennerberg, and M. Edoff, Phys. Status Solidi C 5, 612 (2008).
12. X. Song, P. Qu, H. Yang, X. He, and G. Qiu, J. Central South Univ. Technol. 12, 536 (2005).
13. W. Shao, R. Ma, and B. Liu, J. Univ. Sci. Technol. B 13, 346 (2006).
14. A. V. Singh, R. M. Mehra, A. Yoshida, and A. Wakahara, J. Appl. Phys. 95, 3640 (2004).
15. Y. Liu, L. Zhao, and J. Lian, Vacuum 81, 18 (2006).
16. D. Song, A. G. Aberle, and J. Xia, Appl. Surf. Sci. 195, 291 (2002).
17. H. Tanaka, K. Ihara, T. Miyata, H. Sato, and T. Minami, J. Vac. Sci. Technol. A 22, 1757 (2004).
18. T. Minami, Semicond. Sci. Technol. 20, S35 (2005).