Combinatorial optimization of a molecular glass photoresist system for electron beam lithography

Advanced Materials

Volumn 23, Issue 45, 2011, Pages 5404-5408

  Bauer, Wolfgang Andreas C ^a   Neuber, Christian ^b   Ober, Christopher K ^c   Schmidt, Hans Werner ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF BAYREUTH   (Germany)

^c Cornell University ^*  (United States)

Author keywords

combinatorial library; electron beam lithography; molecular glass; negative tone resists

Indexed keywords

BAKING TEMPERATURE; COMBINATORIAL LIBRARY; DEVELOPMENT TIME; DOSE VARIATIONS; INTERACTING PROCESS; MOLECULAR GLASS; NEGATIVE TONE RESIST; ORTHOGONAL GRADIENTS; PATTERN QUALITY; STEPWISE OPTIMIZATION;

COMBINATORIAL OPTIMIZATION; ELECTRON BEAM LITHOGRAPHY; GLASS; NANOSTRUCTURES; OPTIMIZATION; PHOTORESISTS;

ELECTRON BEAMS;

ACETYLENEUREA; ALKYNE; GLASS; IMIDAZOLE DERIVATIVE; PHENOL; SULFONIC ACID DERIVATIVE;

ARTICLE; CHEMISTRY; ELECTRON; LIGHT; METHODOLOGY; PRINTING;

ALKYNES; ELECTRONS; GLASS; IMIDAZOLES; LIGHT; PHENOL; PRINTING; SULFONIC ACIDS;

EID: 82455210297     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201103107     Document Type: Article

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