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Volumn 101, Issue 8, 2012, Pages

Negligible carrier freeze-out facilitated by impurity band conduction in highly p-type GaN

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION EFFICIENCY; CRYOGENIC TEMPERATURES; DOPED SAMPLE; EFFECTIVE ACTIVATION ENERGY; FREEZE OUT; HALL EFFECT MEASUREMENT; HEAVILY DOPED; HIGH RESISTIVITY; IMPURITY BAND CONDUCTION; MOTT-INSULATOR TRANSITION; P-TYPE GAN; TEMPERATURE DEPENDENT;

EID: 84865479739     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4747466     Document Type: Article
Times cited : (73)

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    • Role of sapphire nitridation temperature on GaN growth by plasma assisted molecular beam epitaxy: Part II. Interplay between chemistry and structure of layers
    • DOI 10.1063/1.1435835
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.