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Volumn 6, Issue SUPPL. 2, 2009, Pages
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Extremely high hole concentrations in c-plane GaN
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Author keywords
[No Author keywords available]
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Indexed keywords
CO-DOPING;
CRYSTAL QUALITIES;
CRYSTALLINE QUALITY;
GA FLUX;
GROWTH CONDITIONS;
HALL MEASUREMENTS;
LIMIT SURFACE;
LOW RESISTIVITY;
MG INCORPORATION;
P-TYPE;
QUALITY MATERIALS;
RESIDUAL IMPURITIES;
RICH CONDITIONS;
SHUTTER TIMINGS;
TEMPERATURE DEPENDENT;
VACANCY DEFECTS;
X-RAY DIFFRACTION DATA;
ACTIVATION ENERGY;
CONCENTRATION (PROCESS);
CRYSTAL IMPURITIES;
DIFFRACTION;
GALLIUM ALLOYS;
GALLIUM NITRIDE;
OXYGEN;
SURFACE DEFECTS;
VACANCIES;
X RAY DIFFRACTION;
HOLE CONCENTRATION;
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EID: 67650769177
PISSN: 18626351
EISSN: 16101642
Source Type: Journal
DOI: 10.1002/pssc.200880962 Document Type: Article |
Times cited : (27)
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References (6)
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