메뉴 건너뛰기




Volumn 22, Issue 14, 2012, Pages 2927-2938

Triangular elastomeric stamps for optical applications: Near-field phase shift photolithography, 3D proximity field patterning, embossed antireflective coatings, and SERS Sensing

Author keywords

antireflective coatings; embossing; phase shift lithography; polydimethylsiloxane; proximity field nanopatterning; surface enhanced Raman spectroscopy

Indexed keywords

ANTI REFLECTIVE COATINGS; EMBOSSING; PHASE SHIFT LITHOGRAPHY; PROXIMITY FIELD NANOPATTERNING; SURFACE ENHANCED RAMAN SPECTROSCOPY;

EID: 84863952562     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.201102455     Document Type: Article
Times cited : (49)

References (79)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.