Antireflective structure imprinted on the surface of optical glass by SiC mold

Applied Surface Science

Volumn 255, Issue 7, 2009, Pages 4267-4270

  Yamada, Kazuhiro ^a   Umetani, Makoto ^a   Tamura, Takamasa ^a   Tanaka, Yasuhiro ^a   Kasa, Haruya ^b   Nishii, Junji ^b  

^a PANASONIC CORPORATION   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Antireflective surface; Electron beam lithography; Glass; Optical element; Reactive ion etching; Subwavelength structure

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; GLASS; MOLDS; OPTICAL DEVICES; OPTICAL GLASS; SILICON CARBIDE; SILICON COMPOUNDS;

ANTIREFLECTIVE STRUCTURE; ANTIREFLECTIVE SURFACES; ELECTRON BEAM DRAWINGS; IMPRINTING PROCESS; OPTIMIZED STRUCTURES; POLISHED SURFACES; SUB-WAVELENGTH STRUCTURES; SURFACE REFLECTANCE;

REACTIVE ION ETCHING;

EID: 58149088517     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.11.020     Document Type: Article

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