Sub-150 nm, high-aspect-ratio features using near-field phase-shifting contact lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 3, 2003, Pages 1143-1148

  Dang, Hai ^a   Tan, Jackie Lim Piu ^a   Horn, Mark W ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; LITHOGRAPHY; MASKS; PHASE SHIFT; PHOTORESISTS; QUARTZ; SILICON WAFERS; ULTRAVIOLET RADIATION;

PHASE-SHIFTING CONTACT LITHOGRAPHY;

ASPECT RATIO;

EID: 0038793636     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1577126     Document Type: Article

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