Microscale features and surface chemical functionality patterned by electron beam lithography: A novel route to poly(dimethylsiloxane) (PDMS) stamp fabrication

Langmuir

Volumn 22, Issue 15, 2006, Pages 6712-6718

  Russell, Matthew T ^a   Pingree, Liam S C ^b   Hersam, Mark C ^b   Marks, Tobin J ^a,b  

^a NORTHWESTERN UNIVERSITY   (United States)

^b Northwestern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION MASS SPECTROSCOPY; MICROCONTACT PRINTING; POLY DIMETHYLSILOXANE (PDMS); WRITING PATTERNS;

ATOMIC FORCE MICROSCOPY; COMPUTATIONAL METHODS; ELECTRON BEAM LITHOGRAPHY; PHOTOLITHOGRAPHY; PHOTORESISTORS; SELF ASSEMBLY; THERMOGRAVIMETRIC ANALYSIS;

AROMATIC POLYMERS;

BAYSILON; DIMETICONE; SILICONE DERIVATIVE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTRICITY; ELECTRON; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; SENSITIVITY AND SPECIFICITY; SURFACE PROPERTY;

DIMETHYLPOLYSILOXANES; ELECTRONS; ELECTROSTATICS; MATERIALS TESTING; MICROSCOPY, ATOMIC FORCE; NANOTECHNOLOGY; SENSITIVITY AND SPECIFICITY; SILICONES; SURFACE PROPERTIES;

EID: 33746626357     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la060319i     Document Type: Article

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