A new pre-etching pattern to determine 〈110〉 crystallographic orientation on both (100) and (110) silicon wafers

Microsystem Technologies

Volumn 11, Issue 2-3, 2005, Pages 117-128

  Chang, W H ^a   Huang, Y C ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; ETCHING; MASKS; STATISTICAL METHODS;

ANISOTROPIC WET ETCHING; ETCHING RATE; MASK GENERATORS; MASK PATTERNS;

SILICON WAFERS;

EID: 24044507027     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-004-0456-6     Document Type: Article

References (16)

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