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Volumn 71, Issue 26, 1997, Pages 3773-3775

Imaging the irradiance distribution in the optical near field

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; DIFFRACTION; LIGHT; OPTIMIZATION; PHOTORESISTS; PHOTOSENSITIVITY;

EID: 0031373875     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120502     Document Type: Article
Times cited : (75)

References (19)
  • 5
    • 0000254557 scopus 로고
    • edited by R. Newman Elsevier, North-Holland, New York
    • B. J. Lin, in Fine Line Lithography, edited by R. Newman (Elsevier, North-Holland, New York, 1980), pp. 105-232.
    • (1980) Fine Line Lithography , pp. 105-232
    • Lin, B.J.1
  • 17
    • 0004084481 scopus 로고
    • Wiley, New York
    • M. V. Klein, Optics (Wiley, New York, 1970).
    • (1970) Optics
    • Klein, M.V.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.