Three dimensional silicon photonic crystals fabricated by two photon phase mask lithography

Applied Physics Letters

Volumn 94, Issue 1, 2009, Pages

  Shir, D ^a   Nelson, E C ^a   Chen, Y C ^a   Brzezinski, A ^a   Liao, H ^a   Braun, P V ^a,b   Wiltzius, P ^a,b   Bogart, K H A ^c   Rogers, J A ^a,b  

^a University of Illinois at Urbana Champaign   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^c SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; CRYSTALS; OPTICAL PROPERTIES; PHOTONS; POLYMERS; THREE DIMENSIONAL;

POLYMER STRUCTURES; POLYMER TEMPLATES; SILICON PHOTONIC CRYSTALS; SINGLE STEPS; SPECTROSCOPIC MEASUREMENTS; STRUCTURAL QUALITIES; THREE-DIMENSIONAL PHOTONIC CRYSTALS; TWO PHOTONS;

PHOTONIC CRYSTALS;

EID: 58149498680     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3036955     Document Type: Article

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