Perfectly hydrophobic surfaces with patterned nanoneedles of controllable features

Langmuir

Volumn 26, Issue 8, 2010, Pages 5295-5299

  Park, Sung Gyu ^a   Lee, Su Yeon ^a   Jang, Se Gyu ^a   Yang, Seung Man ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL COMPOSITIONS; HEXAGONAL ARRAYS; HYDROPHOBIC SURFACES; NANONEEDLE ARRAYS; PATTERN DENSITY; SILICA MICROSPHERES; SILICA PARTICLES; THERMOPLASTIC POLYSTYRENE; WATER CONTACT ANGLE;

CONTACT ANGLE; HYDROPHOBICITY; MONOLAYERS; NANONEEDLES; POLYSTYRENES; REACTIVE ION ETCHING; SILICA; SURFACE CHEMISTRY; WET ETCHING;

SURFACE MORPHOLOGY;

EID: 77950950659     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la100409c     Document Type: Article

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