Nanopatterning with conformable phase masks

Journal of Photochemistry and Photobiology A: Chemistry

Volumn 166, Issue 1-3, 2004, Pages 149-154

  Maria, Joana ^a   Jeon, Seokwoo ^a   Rogers, John A ^a,b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

Elastomer; Nanofabrication; Near field optics; Phase mask; Photolithography; Soft lithography

Indexed keywords

ELASTOMER;

ARTICLE; CHEMICAL REACTION; CHEMICAL STRUCTURE; CONTROLLED STUDY; NANOTECHNOLOGY; OPTICS; PHOTOCHEMISTRY; RADIATION EXPOSURE; SEMICONDUCTOR; STRUCTURE ANALYSIS; ULTRAVIOLET RADIATION;

EID: 3543112010     PISSN: 10106030     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jphotochem.2004.04.035     Document Type: Article

References (8)

1. Mirkin C.A. Rogers J.A. MRS Bull. 26 2001 506
2. Xia Y. Rogers J.A. Paul K.E. Whitesides G.M. Chem. Rev. 99 1999 1823-1848
3. Rogers J.A. Paul K.E. Jackman R.J. Whitesides G.M. Appl. Phys. Lett. 70 1997 2658-2660
4. Rogers J.A. Paul K.E. Jackman R.J. Whitesides G.M. J. Vac. Sci. Techn. B 16 1998 59-68
5. Aizenberg J. Rogers J.A. Paul K.E. Whitesides G.M. Appl. Opt. 37 1998 2145-2152
6. Rogers J.A. Dodabalapur A. Bao Z. Katz H.E. Appl. Phys. Lett. 75 1999 1010-1012
7. Aizenberg J. Rogers J.A. Paul K.E. Whitesides G.M. Appl. Phys. Lett. 71 1997 3773-3775
8. Odom T.W. Love J.C. Wolfe D.B. Paul K.E. Whitesides G.M. Langmuir 18 2002 5314-5320