Nanolithography by elastomeric scattering mask: An application of photolithographic standing waves

Applied Physics Letters

Volumn 88, Issue 13, 2006, Pages

  Kostovski, Gorgi ^a   Mitchell, Arnan ^a   Holland, Anthony ^a   Fardin, Ernest ^a   Austin, Michael ^a  

^a RMIT UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTOMERS; NANOTECHNOLOGY; PHOTORESISTORS; STANDING WAVE METERS; WAVE EFFECTS;

PHOTORESIST PATTERNS; POLYDIMETHYLSILOXANE (PDMS); STANDING WAVES;

PHOTOLITHOGRAPHY;

EID: 33645532049     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2190899     Document Type: Article

References (7)

1. D. Quin, Y. Xia, A. J. Black, and G. M. Whitesides, J. Vac. Sci. Technol. B 16, 98 (1998).
2. J. A. Rogers, K. E. Paul, R. J. Jackman, and G. M. Whitesides, J. Vac. Sci. Technol. B 16, 59 (1998).
3. H. Schmid, H. Biebuyck, and B. Michel, Appl. Phys. Lett. 72, 2379 (1998).
4. J. Maria, S. Jeon, and J. A. Rogers, J. Photochem. Photobiol., A 166, 149 (2004).
5. A. G. Grandpierre, R. Schiwon, and F. Finger, Metrology, Inspection, and Process Control for Microlithography XIX, edited by, M. Voet, R. Willsch, W. Ecke, J. Jones, and, B. Culshaw, (SPIE, Bellingham, WA, 2005), p. 755.
6. N. Bogdanski, H. Schulz, M. Wissen, H.-C. Scheer, J. Zajadacz, and K. Zimmer, Microelectron. Eng. 73-74, 190 (2004).
7. A. K. Bates, M. Rothschild, T. M. Bloomstein, T. H. Fedynyshyn, R. R. Kunz, V. Liberman, and M. Switkes, IBM J. Res. Dev. 45, 605 (2001).