Hard x-ray photoelectron spectroscopy study of the electroforming in Ti/HfO2-based resistive switching structures

Applied Physics Letters

Volumn 100, Issue 23, 2012, Pages

  Sowinska, M ^a   Bertaud, T ^a   Walczyk, D ^a   Thiess, S ^b   Schubert, M A ^a   Lukosius, M ^a   Drube, W ^b   Walczyk, Ch ^a   Schroeder, T ^a,c  

^a IHP   (Germany)

^b DESY   (Germany)

^c BRANDENBURG UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODE OXIDATION; ELECTRONIC MODIFICATIONS; HARD X-RAY PHOTOELECTRON SPECTROSCOPY; NON DESTRUCTIVE; RESISTIVE SWITCHING;

BINDING ENERGY; CHEMICAL MODIFICATION; ELECTROFORMING; HAFNIUM OXIDES; PHOTOELECTRONS; TITANIUM; TITANIUM NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

SWITCHING SYSTEMS;

EID: 84862150858     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4728118     Document Type: Article

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