Atomic scale observation of phase separation and formation of silicon clusters in Hf higk-κ silicates

Journal of Applied Physics

Volumn 111, Issue 10, 2012, Pages

  Talbot, E ^a   Roussel, M ^a   Genevois, C ^a   Pareige, P ^a   Khomenkova, L ^b   Portier, X ^b   Gourbilleau, F ^b  

^a UNIVERSITÉ ET INSA DE ROUEN   (France)

^b UNIVERSITÉ DE CAEN   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SI; AS-GROWN; ATOM PROBE TOMOGRAPHY; ATOMIC SCALE; DECOMPOSITION PROCESS; HAFNIUM SILICATE FILMS; HOMOGENEOUS FILMS; MEAN DIAMETER; MICROSTRUCTURAL ANALYSIS; PHASE-SEPARATION PROCESS; PHOTONIC APPLICATION; RF REACTIVE MAGNETRON SPUTTERING; SI NANOCLUSTER; SILICON CLUSTERS;

AMORPHOUS FILMS; DIELECTRIC MATERIALS; HAFNIUM; HAFNIUM OXIDES; MICROELECTRONICS; NANOCLUSTERS; PHASE SEPARATION; SILICATES; SILICON; SILICON OXIDES; TRANSMISSION ELECTRON MICROSCOPY;

AMORPHOUS SILICON;

EID: 84862141791     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4718440     Document Type: Conference Paper

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