An original approach for the fabrication of Si/SiO2 multilayers using reactive magnetron sputtering

Thin Solid Films

Volumn 419, Issue 1-2, 2002, Pages 5-10

  Ternon, C ^a   Gourbilleau, F ^a   Portier, X ^a   Voivenel, P ^a   Dufour, C ^a  

^a LERMAT Laboratoire d'Etude et de Recherche sur les Materiaux   (France)

Author keywords

Multilayers; Photoluminescence; Si SiO2; Sputtering

Indexed keywords

ABSORPTION SPECTROSCOPY; ARGON; INFRARED SPECTROSCOPY; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; PHOTOLUMINESCENCE; PLASMAS; SILICA; SILICON; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

QUANTUM CONFINEMENT EFFECTS;

MULTILAYERS;

EID: 0036849794     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00294-8     Document Type: Article

References (25)

1. Canham L.T. Appl. Phys. Lett. 57:1996;1046.
2. Liao L.S., Bao X.M., Zheng X.Q., Li N.S., Min N.B. Appl. Phys. Lett. 68:1996;850.
3. Rebohle L., Von Borany J., Skorupa W., Tyschenko I.E., Fröb H. J. Lumin. 80:1999;275.
4. Inokuma, Wakayama Y., Muramoto T., Aoki R., Kurata Y., Hasegawa S. J. Appl. Phys. 83:1998;2228.
5. Charvet S., Madelon R., Gourbilleau F., Rizk R. J. Lumin. 80:1999;257.
6. Kansagawa Y., Kageyama T., Takeoka S., Fugiti M., Hayashi S., Yammoto K. Solid State Commun. 102:1997;533.
7. Lockwood D.J., Lu Z.H., Baribeau J.M. Phys. Rev. Lett. 76:1996;539.
8. Wu X.L., Siu G.G., Tong S., Liu X.N., Yan F., Jiang S.S., Zhang X.K., Feng D. Appl. Phys. Lett. 69:1996;523.
9. Tsybeskov L., Hirschman K.D., Dutlagupta S.P., Zacharias M., Fauchet P.M., McCaffrey J.P., Lockwood D.J. Appl. Phys. Lett. 72:1998;43.
10. Sullivan B.T., Lockwood D.J., Labbe H.J., Lu Z.H. Appl. Phys. Lett. 69:1996;539.
11. Gourbilleau F., Voivenel P., Portier X., Rizk R. Microelec. Reliability. 40:2000;889.
12. Cullis A.G., Canham L.T., Calcott P.D.J. J. Appl. Phys. 82:1997;909.
13. Charvet S., Madelon R., Gourbilleau F., Rizk R. J. Appl. Phys. 85:1999;4032.
14. Zacharias M., Bläsing J., Veit P., Tsybeskov L., Hirschman K., Fauchet. Appl. Phys. Lett. 74:1999;2614.
15. Gourbilleau F., Portier X., Ternon C., Voivenel P., Madelon R., Rizk R. Appl. Phys. Lett. 78:2001;3058.
16. S. Charvet, Ph.D. Thesis, Nr TCAS-1999-23, University of Caen, France, 1999.
17. Tsai C.C., Thompson R., Doland C., Ponce F.A., Anderson G.B., Waker B. Mater. Res. Soc. Symp. Proc. 118:1989;49.
18. Akasaka T., Shimizu I. Appl. Phys. Lett. 66:1995;3441.
19. Olsen J.E., Shimura F. J. Appl. Phys. 66:1989;1353.
20. Kirk C.T. Phys. Rev. B. 38:1998;1255.
21. Strass A., Hansck W., Bieringer P., Neubecker A., Kaesen F., Fisher A., Eisele I. Surf. Coat. Tech. 97:1997;158-162.
22. S. Veprek, A.P. Webb, Proceedings of the Fourth International Symposium on Plasma Chemistry, Zürich, 1974, p. 79.
23. Van Buuren T., Dinh L.N., Chase L.L., Siekhaus W.J., Terminello L.J. Phys. Rev. Lett. 80:1998;3803.
24. Delerue C., Allan G., Lannoo M. Phys. Rev. B. 48:1993;11024.
25. Garrido B., Lopez M., Gonzalez O., Pérez-Rodriguez A., Morante J.R. Appl. Phys. Lett. 77:2000;3143.