Surface-directed spinodal decomposition in the pseudobinary alloy (HfO 2)x(SiO2)1-x

Journal of Applied Physics

Volumn 107, Issue 12, 2010, Pages

  Liu, J ^a   Wu, X ^b   Lennard, W N ^a   Landheer, D ^b   Dharma Wardana, M W C ^b  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ALLOY SYSTEM; ANGLE-RESOLVED X-RAY PHOTOELECTRON SPECTROSCOPY; ANNEALED FILMS; AS-GROWN; FILM DEPTH; FILM SURFACES; FILMS THINNER; HF-SILICATE FILMS; HRTEM IMAGES; LAYERED STRUCTURES; MEDIUM ENERGY ION SCATTERING; NON-UNIFORM DISTRIBUTION; PSEUDO-BINARIES; SILICON SUBSTRATES; SURFACE-DIRECTED SPINODAL DECOMPOSITION;

ATOMIC LAYER DEPOSITION; CERIUM ALLOYS; ELECTRON ENERGY LOSS SPECTROSCOPY; HAFNIUM; HAFNIUM COMPOUNDS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICATES; SILICON OXIDES; TERNARY SYSTEMS; X RAY PHOTOELECTRON SPECTROSCOPY;

SPINODAL DECOMPOSITION;

EID: 77954201144     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3448232     Document Type: Article

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