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Volumn 14, Issue 22, 2012, Pages 7954-7964

First principles simulation of reaction steps in the atomic layer deposition of titania: Dependence of growth on Lewis acidity of titanocene precursor

Author keywords

[No Author keywords available]

Indexed keywords


EID: 84861381142     PISSN: 14639076     EISSN: None     Source Type: Journal    
DOI: 10.1039/c2cp40491e     Document Type: Article
Times cited : (25)

References (62)
  • 19
    • 84861362440 scopus 로고    scopus 로고
    • Cyclopentadienyl precursors for ALD: Insights from atomic scale simulation", presented at the 8th International Conference on Atomic Layer Deposition, Bruges, Belgium, 29 June-2 July 2008
    • S. Elliott, A. Zydor and M. Nolan, "Cyclopentadienyl precursors for ALD: Insights from atomic scale simulation", presented at the 8th International Conference on Atomic Layer Deposition, Bruges, Belgium, 29 June-2 July 2008
    • Elliott, S.1    Zydor, A.2    Nolan, M.3
  • 29
    • 84861392809 scopus 로고    scopus 로고
    • Study on Thermal Stability and Water Reactivity of Various Metal-Organic Titanium Precursors", presented at the 10th International Conference on Atomic Layer Deposition, 21 June 2010, Seoul, Korea
    • S. Haukka, E. Tois, R. Matero A. Root, P. Ingman A. Zauner and S. Rushworth, "Study on Thermal Stability and Water Reactivity of Various Metal-Organic Titanium Precursors", presented at the 10th International Conference on Atomic Layer Deposition, 21 June 2010, Seoul, Korea
    • Haukka, S.1    Tois, E.2    Matero, R.3    Root, A.4    Ingman, P.5    Zauner, A.6    Rushworth, S.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.