Molecular dynamics simulation of the Al2O3 film structure during atomic layer deposition

Molecular Simulation

Volumn 35, Issue 4, 2009, Pages 270-279

  Hu, Zheng ^a   Shi, Junxia ^b   Heath Turner, C ^a  

^a University of Alabama   (United States)

^b School of Operations Research and Industrial Engineering   (United States)

Author keywords

Al2O3; Atomic layer deposition; Interface; Molecular dynamics

Indexed keywords

AL2O3; AL2O3 FILMS; ATOMIC LEVELS; ATOMIC SCALE; COMPUTATIONAL RESULTS; DEPOSITED FILMS; EXPERIMENTAL MEASUREMENTS; GROWTH DYNAMICS; GROWTH MECHANISMS; GROWTH MODES; INTERFACE; MICROSCOPIC STRUCTURES; MOLECULAR DYNAMICS SIMULATIONS; OPERATION PARAMETERS; PROCESS TEMPERATURE; SURFACE COMPOSITIONS; TIME-SCALES;

AMORPHOUS FILMS; ATOMS; DYNAMICS; MOLECULAR DYNAMICS; REACTION KINETICS; SURFACE REACTIONS; SURFACE RELAXATION; SURFACE ROUGHNESS;

ATOMIC LAYER DEPOSITION;

EID: 68149149842     PISSN: 08927022     EISSN: 10290435     Source Type: Journal    
DOI: 10.1080/08927020802468372     Document Type: Article

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