Reversible wettability control of TiO2 surface by light irradiation

Surface Science

Volumn 511, Issue 1-3, 2002, Pages 401-407

  Miyauchi, Masahiro ^a   Kieda, Nobuo ^b   Hishita, Shunichi ^c   Mitsuhashi, Takefumi ^c   Nakajima, Akira ^d   Watanabe, Toshiya ^a   Hashimoto, Kazuhito ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b SHONAN INSTITUTE OF TECHNOLOGY   (Japan)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^d Advanced Systems of Technology Incubation   (Japan)

Author keywords

Chemical vapor deposition; Photochemistry; Semiconducting surfaces; Surface structure, morphology, roughness, and topography; Titanium oxide; Wetting

Indexed keywords

ADSORPTION; IRRADIATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; PHOTOCHEMICAL REACTIONS; SURFACE ROUGHNESS; TITANIUM OXIDES; WETTING;

SEMICONDUCTING SURFACES;

SURFACE REACTIONS;

EID: 0036608672     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(02)01551-0     Document Type: Article

References (29)