TiCp*(OMe) 3 versus Ti(OMe) 4 in atomic layer deposition of TiO 2 with water - Ab initio modelling of atomic layer deposition surface reactions

Journal of Nanoscience and Nanotechnology

Volumn 11, Issue 9, 2011, Pages 8089-8093

  Zydor, Aleksandra ^a   Elliott, Simon D ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

Atomic layer deposition (ALD); DFT; TiO 2

Indexed keywords

AB INITIO MODELLING; ALD GROWTH; ATOMIC LAYER; COMMON FINDINGS; DFT; GASPHASE; SURFACE MODELS; THREE DIMENSIONS; TIO;

ADSORPTION; ATOMIC LAYER DEPOSITION; CALCULATIONS; DESORPTION; LIGANDS; TITANIUM DIOXIDE;

SURFACE REACTIONS;

EID: 84856944339     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2011.5108     Document Type: Conference Paper

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