Competing mechanisms in atomic layer deposition of Er2 O 3 versus la2O3 from cyclopentadienyl precursors

Chemistry of Materials

Volumn 22, Issue 1, 2010, Pages 117-129

  Nolan, Michael ^a   Elliott, Simon D ^a  

^a UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ALD GROWTH; COMPETING MECHANISMS; CONTROLLED GROWTH; CYCLOPENTADIENYL PRECURSOR; CYCLOPENTADIENYLS; FIRST-PRINCIPLES; GROWTH REACTIONS; HEXAGONAL PHASE; HYDROGEN TRANSFER; KEY REACTIONS; METAL PRECURSOR; NANOSCALE THIN FILMS; OXIDE SURFACE; PERIODIC DENSITY FUNCTIONAL THEORY; PRECURSOR MOLECULES; RARE EARTH OXIDE; RARE-EARTH METAL OXIDE; REACTIVE ADSORPTION; TECHNOLOGY APPLICATION;

ADSORBATES; ADSORPTION; DENSITY FUNCTIONAL THEORY; DEPOSITION; DESORPTION; ERBIUM; GROWTH (MATERIALS); LIGANDS; RARE EARTHS; SURFACE STRUCTURE; THIN FILMS;

LANTHANUM;

EID: 74949135904     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm902469c     Document Type: Article

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