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Volumn 24, Issue 4, 2006, Pages 1535-1539

Characteristics of atomic layer deposited TiO2 films and their photocatalytic activity

a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; CRYSTALLINE MATERIALS; DEPOSITION; FILM GROWTH; PHOTOCATALYSIS; TEMPERATURE DISTRIBUTION; TITANIUM DIOXIDE;

ATOMIC LAYER DEPOSITION (ALD); METHYLENE BLUE; ROOT-MEAN-SQUARE ROUGHNESS; TETRAKIS-DIMETHYL-AMIDO TITANIUM;

THIN FILMS;

EID: 33745482954 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.2172941 Document Type: Article

Times cited : (47)

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