Electron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-off

Beilstein Journal of Nanotechnology

Volumn 3, Issue 1, 2012, Pages 101-113

  She, Zhe ^a   DiFalco, Andrea ^b   Hähner, Georg ^a   Buck, Manfred ^a  

^a UNIVERSITY OF ST ANDREWS   (United Kingdom)

^b UNIVERSITY OF ST ANDREWS   (United Kingdom)

Author keywords

Electrochemical nanotechnology; Electrodeposition; Lithography; Metallic nanostructures; Self assembled monolayers; Thiols

Indexed keywords

ACIDIC SOLUTIONS; AFM; COPPER SURFACE; ELECTROCHEMICAL DEPOSITION; ELECTROCHEMICAL NANOTECHNOLOGY; EPOXY GLUE; GROWTH PHASE; HIGH FIDELITY; METAL STRUCTURES; METALLIC NANOSTRUCTURES; POLYCRYSTALLINE GOLD; THIOLS; TWO-STEP PROCEDURE;

GOLD DEPOSITS; LITHOGRAPHY; REDUCTION; SELF ASSEMBLED MONOLAYERS; SUBSTRATES;

ELECTRODEPOSITION;

EID: 84856802964     PISSN: None     EISSN: 21904286     Source Type: Journal    
DOI: 10.3762/bjnano.3.11     Document Type: Article

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